Himmerlich, M.M.HimmerlichYanev, V.V.YanevOpitz, A.A.OpitzKeppler, A.A.KepplerSchäfer, J.A.J.A.SchäferKrischok, S.S.Krischok2022-03-042022-03-042008https://publica.fraunhofer.de/handle/publica/21571110.1016/j.polymdegradstab.2007.12.004en670660Effects of X-ray radiation on the surface chemical composition of plasma deposited thin fluorocarbon filmsjournal article