Do we need complex resist models for predictive simulation of lithographic process performance?

Tollkühn, B.B.TollkühnErdmann, A.A.ErdmannLammers, J.J.LammersNolscher, C.C.NolscherSemmler, A.A.Semmler2022-03-102022-03-102004https://publica.fraunhofer.de/handle/publica/34484810.1117/12.534045en670620530Do we need complex resist models for predictive simulation of lithographic process performance?conference paper