Under CopyrightFader, RobertRobertFaderFörthner, MichaelMichaelFörthnerRumler, MaximilianMaximilianRumlerRommel, MathiasMathiasRommelBauer, A.J.A.J.BauerFrey, LotharLotharFreyVerschuuren, MarcMarcVerschuurenButschke, JörgJörgButschkeIrmscher, MathiasMathiasIrmscherStorace, EleonoraEleonoraStoraceJi, RanRanJiSchömbs, UlrikeUlrikeSchömbs2022-03-1210.4.20152014https://publica.fraunhofer.de/handle/publica/38700810.24406/publica-fhg-387008ennanoimprintSCIL670620530Structure placement accuracy of wafer level stamps for substrate conformal imprint lithographyposter