Steingrüber, R.R.SteingrüberHamacher, M.M.Hamacher2022-03-032022-03-031997https://publica.fraunhofer.de/handle/publica/19175010.1016/S0167-9317(96)00092-52-s2.0-0031069435A novel process enabling the simultaneous electron-beam exposure of different types of structures is presented, illustrated by the synchronous generation of filter gratings and waveguides. Optimized results for a precise adjustment of the interface waveguide-grating are shown, as well as the necessity for proximity correction achieved by dose assignment. The accommodation of the different address grids makes the pre-fixing of the vertical and horizontal adjustments possible. The structures are then transferred into the semiconductor by means of dry etching. The devices and their characteristic filter curves are presented.enelectron beam lithographyintegrated optoelectronicsoptical planar waveguidesoptical receiversoptical waveguide filtersproximity effect (lithography)direct write electron-beam lithographysimultaneous exposurefilter gratingswaveguidessynchronous generationprecise adjustmentinterface waveguide-gratingproximity correctiondose assignmentaddress gridsdry etchingcharacteristic filter curvesphotonic integrated circuitsbidirectional transceiver621journal article