Stress induced leakage currents and charge trapping in thin Zr- and Hf-silicate layers

Paskaleva, A.A.PaskalevaLemberger, M.M.LembergerBauer, A.J.A.J.Bauer2022-03-102022-03-102006https://publica.fraunhofer.de/handle/publica/35255310.1109/ICMEL.2006.1651025en670620530Stress induced leakage currents and charge trapping in thin Zr- and Hf-silicate layersconference paper