Rangelow, J.W.J.W.Rangelow2022-03-022022-03-021985https://publica.fraunhofer.de/handle/publica/1726942-s2.0-0022197524Gold patterns for x-ray masks can by obtain through pattern transfer in gold-absorbers by method of Ion-Beam Etching and Chemicall Assisted Ion-Beam Etching. This work presents results of pattern transfer ty soft mask (resist) and hard mask (metal layer) through a three-stage etching process in Au-absorber and a resulting wall inclination of approx. 86 graduation (quasiperpendicular).en621journal article