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  4. Accuracy analysis of a stand-alone EUV spectrometer for the characterization of ultrathin films and nanoscale gratings
 
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2020
  • Konferenzbeitrag

Titel

Accuracy analysis of a stand-alone EUV spectrometer for the characterization of ultrathin films and nanoscale gratings

Abstract
In this contribution the accuracy of measurements performed with a stand-alone EUV spectrometer is analyzed. The setup is used to determine optical constants and dimensional characteristics of samples, e.g. ultrathin films or nanoscale gratings. For this purpose, measurements of the broadband EUV reflectance of the samples at variable grazing incidence angles are used to reconstruct sample parameters in a model-based approach. The accuracy of these measurements is a crucial factor for a reliable characterization of samples. We present an overview on the sources of uncertainties in the experimental setup as well as improvements to the setup that improves its accuracy. Additionally, the reconstruction accuracy of the optical constants is analyzed. A focus is put on the influence of the experimental uncertainty and the range of incidence angles used for reflectance measurements.
Author(s)
Schröder, Sophia
Bahrenberg, Lukas
Eryilmaz, Nimet Kutay
Glabisch, Sven
Danylyuk, Serhiy
Brose, Sascha
Stollenwerk, Jochen
Loosen, Peter
Hauptwerk
Extreme Ultraviolet Lithography 2020
Konferenz
Conference "Extreme Ultraviolet Lithography" 2020
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DOI
10.1117/12.2573148
Language
Englisch
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ILT
Tags
  • metrology

  • semiconductor lasers

  • grazing incidence ref...

  • extreme ultraviolet l...

  • critical dimension me...

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