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  4. Electrolytic nickel deposition for the front side metallization of silicon solar cells
 
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2009
  • Konferenzbeitrag

Titel

Electrolytic nickel deposition for the front side metallization of silicon solar cells

Abstract
In this work the formation of a nickel seed layer for the front side metallization of silicon solar cells based on light induced plating (LIP) is presented. Nickel is plated from a Nickel Watts electrolyte. The influence of LIP parameters like the intensity of the incident light and the applied potential to the rear side of the solar cell has been investigated. After generating the nickel seed layer the contacts were thickened by a cyanide-free silver LIP step. First promising results were obtained producing industrial solar cells with a cell efficiency of 16.8 %.
Author(s)
Bay, N.
Radtke, V.
Aleman, M.
Bartsch, J.
Glunz, S.W.
Hauptwerk
24th European Photovoltaic Solar Energy Conference 2009. CD-ROM
Konferenz
European Photovoltaic Solar Energy Conference and Exhibition (EU PVSEC) 2009
DOI
10.4229/24thEUPVSEC2009-2CV.2.7
File(s)
001.pdf (223.06 KB)
Language
Englisch
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