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One-level gray-tone lithography - mask data preparation and pattern transfer
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1996
Conference Paper
Titel
One-level gray-tone lithography - mask data preparation and pattern transfer
Author(s)
Reimer, K.
Quenzer, H.J.
Demmeler, R.
Wagner, B.
Hauptwerk
Micro-optical technologies for measurement, sensors and microsystems
Konferenz
International Symposium on Laser, Optics and Vision for Productivity in Manufacturing 1996
Language
English
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Fraunhofer-Institut für Siliziumtechnologie ISIT
