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The impact of aberration averaging during step-and-scan on the photolithographic process
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1998
Zeitschriftenaufsatz
Titel
The impact of aberration averaging during step-and-scan on the photolithographic process
Author(s)
Erdmann, A.
Arnz, M.
Zeitschrift
Microelectronic engineering
DOI
10.1016/S0167-9317(98)00025-2
Language
Englisch
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