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Plasmatron sputtering for the production of high stability NiCr resistive films
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1984
Journal Article
Titel
Plasmatron sputtering for the production of high stability NiCr resistive films
Author(s)
Schiller, S.
Heisig, U.
Goedicke, K.
Bilz, H.
Henneberger, J.
Brode, W.
Dietrich, W.
Zeitschrift
Thin solid films
DOI
10.1016/0040-6090(84)90536-4
Language
English
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Fraunhofer-Institut für Organische Elektronik, Elektronenstrahl- und Plasmatechnik FEP
