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Electron beam evaporation and high-rate sputtering with plasmatron/magnetron systems - a comparison (Teil II)
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1978
Journal Article
Titel
Electron beam evaporation and high-rate sputtering with plasmatron/magnetron systems - a comparison (Teil II)
Author(s)
Schiller, S.
Heisig, U.
Goedicke, K.
Zeitschrift
Vakuum-Technik
Language
English
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Fraunhofer-Institut für Organische Elektronik, Elektronenstrahl- und Plasmatechnik FEP
