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  4. Advances in high rate sputtering with magnetron-plasmatron processing and instrumentation
 
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1979
Journal Article
Titel

Advances in high rate sputtering with magnetron-plasmatron processing and instrumentation

Author(s)
Schiller, S.
Heisig, U.
Goedicke, K.
Steinfelder, K.
Schade, K.
Teschner, G.
Henneberger, J.
Zeitschrift
Thin solid films
Thumbnail Image
DOI
10.1016/0040-6090(79)90330-4
Language
English
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Fraunhofer-Institut für Organische Elektronik, Elektronenstrahl- und Plasmatechnik FEP
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