English
Deutsch
Log In
Email address
Password
Log in
or
Log in with Shibboleth
Research Outputs
Projects
Researchers
Institutes
Statistics
Fraunhofer-Gesellschaft
Home
Fraunhofer-Gesellschaft
Artikel
Advances in high rate sputtering with magnetron-plasmatron processing and instrumentation
Details
Full
Export
Statistics
Options
1979
Journal Article
Titel
Advances in high rate sputtering with magnetron-plasmatron processing and instrumentation
Author(s)
Schiller, S.
Heisig, U.
Goedicke, K.
Steinfelder, K.
Schade, K.
Teschner, G.
Henneberger, J.
Zeitschrift
Thin solid films
DOI
10.1016/0040-6090(79)90330-4
Language
English
google-scholar
View Details
Fraunhofer-Institut für Organische Elektronik, Elektronenstrahl- und Plasmatechnik FEP