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  4. Control and Improvement of Surface Triangulation for Three-Dimensional Process Simulation
 
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1999
Conference Paper
Title

Control and Improvement of Surface Triangulation for Three-Dimensional Process Simulation

Other Title
Kontrolle und Verbesserung der Oberflächentriangulierung für dreidimensionale Prozess-Simulation
Abstract
Appropriate meshes are crucial for accurate and efficient 3D process simulation. In this paper, we present a set of tools operating on surface and interface triangulations. These tools allow the improvement of the accuracy of interfaces, the reduction of the number of triangles, and the removal of obtuse not coplanarily compensated triangles. The first tool is used within integrated topography simulation environments based on different data structures, e.g. cell-based and segment-based. The latter two are particularly important for providing appropriate input to mesh generation for 3D process simulation.
Author(s)
Bär, E.  orcid-logo
Lorenz, J.  
Mainwork
SISPAD '99. Proceedings  
Conference
International Conference on Simulation of Semiconductor Processes and Devices (SISPAD) 1999  
Language
English
IIS-B  
Keyword(s)
  • Gittergeneration

  • grid generation

  • Halbleitertechnologie

  • Oberflächentriangulierung

  • process simulation

  • Prozeßsimulation

  • semiconductor technology

  • surface triangulation

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