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2002
Journal Article
Title
Advanced diffusion system for low contamination in-line rapid thermal processing of silicon solar cells
Abstract
A novel diffusion system for in-line rapid thermal diffusion is presented. The lamp-heated furnace has a low thermal mass and a metal free transport system based on the walking beam principle. The furnace has been used to process first solar cells with lightly and highly doped emitters respectively. Solar cells with shallow lightly doped emitters show that the emitters processed in the new device can be well passivated. Shallow emitters with sheet resistances of up to 40/sq. have been contacted successfully by means of screen printing and firing through a SiN/sub x/ antireflection coating.
Author(s)
Keyword(s)
diffusion system
low contamination in-line rapid thermal processing
silicon solar cell
lamp-heated furnace
low thermal mass
metal free transport system
walking beam principle
lightly doped emitter
highly doped emitter
shallow lightly doped emitter
shallow emitter
sheet resistance
screen printing
firing
antireflection coating
SiN
Si