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  4. Advanced diffusion system for low contamination in-line rapid thermal processing of silicon solar cells
 
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2002
Journal Article
Title

Advanced diffusion system for low contamination in-line rapid thermal processing of silicon solar cells

Abstract
A novel diffusion system for in-line rapid thermal diffusion is presented. The lamp-heated furnace has a low thermal mass and a metal free transport system based on the walking beam principle. The furnace has been used to process first solar cells with lightly and highly doped emitters respectively. Solar cells with shallow lightly doped emitters show that the emitters processed in the new device can be well passivated. Shallow emitters with sheet resistances of up to 40/sq. have been contacted successfully by means of screen printing and firing through a SiN/sub x/ antireflection coating.
Author(s)
Biro, Daniel  
Preu, Ralf  
Schultz, Oliver  
Peters, S.
Huljic, D.M.
Zickermann, D.
Schindler, Roland
Lüdemann, Ralf
Willeke, Gerhard
Journal
Solar energy materials and solar cells  
DOI
10.1016/S0927-0248(02)00045-4
Language
English
Fraunhofer-Institut für Solare Energiesysteme ISE  
Keyword(s)
  • diffusion system

  • low contamination in-line rapid thermal processing

  • silicon solar cell

  • lamp-heated furnace

  • low thermal mass

  • metal free transport system

  • walking beam principle

  • lightly doped emitter

  • highly doped emitter

  • shallow lightly doped emitter

  • shallow emitter

  • sheet resistance

  • screen printing

  • firing

  • antireflection coating

  • SiN

  • Si

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