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  4. Modern coating and annealing technologies for advanced multifunctional layer stacks
 
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2018
Conference Paper
Title

Modern coating and annealing technologies for advanced multifunctional layer stacks

Abstract
In the last years, the demands for the quality of layers and layer stacks were steadily increasing. In order to optimize the coating processes, the process control needs to be increasingly precise. Consequently, optimized feedback loops, target developments and process control improvements are important factors for the development of innovative thin film products. On the other hand economic factors of e.g. material choice, the efficiency of material utilization and the energy efficiency of the processes are the basis for a cost-efficient high-volume production. As examples MagPECVD processes for the efficient deposition of low stress silica films, Flash lamp annealing (FLA) as an economic post treatment technology and multilayer filters sputtered with high precision requirements will be discussed.
Author(s)
Preußner, Thomas  
Fraunhofer-Institut für Organische Elektronik, Elektronenstrahl- und Plasmatechnik FEP  
Junghähnel, Manuela  
Fraunhofer-Institut für Organische Elektronik, Elektronenstrahl- und Plasmatechnik FEP  
Westphalen, Jasper
Fraunhofer-Institut für Organische Elektronik, Elektronenstrahl- und Plasmatechnik FEP  
Täschner, Kerstin  
Fraunhofer-Institut für Organische Elektronik, Elektronenstrahl- und Plasmatechnik FEP  
Mainwork
Advanced coatings for large-area or high-volume products. The 12th International Conference on Coatings on Glass and Plastics : ICCG 12. CD-ROM  
Conference
International Conference on Coatings on Glass and Plastics (ICCG) 2018  
Language
English
Fraunhofer-Institut für Elektronenstrahl- und Plasmatechnik FEP  
Keyword(s)
  • flash lamp annealing

  • PVD

  • PECVD

  • Filter

  • sputtering

  • optical modelling

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