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2016
Conference Paper
Title

TAIKO wafer ball attach

Abstract
Ball attach on ultra-thin 200 mm TAIKO wafers is considered a challenge but it can be mastered. The TAIKO wafer grinding concept is based on the thinning of an inner area of a silicon wafer leaving an outer ring as stiffening frame for wafer handling without an additional carrier [1]. The process development methodology for a near industrial TAIKO wafer balling pilot line is described. A phased process development methodology was applied with different residual wafer thicknesses, wafer ball diameters and balling pitches to check yield affecting topics and process throughput.
Author(s)
Schröder, S.
Schröder, M.
Reinert, W.
Priewasser, K.H.
Mainwork
IEEE 18th Electronics Packaging Technology Conference, EPTC 2016. Proceedings  
Conference
Electronics Packaging Technology Conference (EPTC) 2016  
DOI
10.1109/EPTC.2016.7861519
Language
English
Fraunhofer-Institut für Siliziumtechnologie ISIT  
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