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Low temperature deposition of indium tin oxide films by plasma ion-assisted evaporation

: Füchsel, K.; Schulz, U.; Kaiser, N.; Tünnermann, A.


Applied optics 47 (2008), Nr.13, S.C297-C302
ISSN: 0003-6935
ISSN: 1539-4522
ISSN: 1559-128X
Fraunhofer IOF ()
transparent conductor; electrical property; optical property; room temperature; thin film; ITO film

Coatings of transparent conductive oxides, especially indium tin oxide (ITO), are important in different fields. So far, application of these materials has been limited to substrates with high thermal stability. We describe an improved coating process for ITO based on plasma ion-assisted evaporation at a substrate temperature below 100 degrees C, which is suitable for organic substrates. In characterizing the thin films, we used the classical Drude theory to calculate the resistivity from optical film properties and compared the data with linear four-point measurements. X-ray diffraction spectroscopy was used to determine the structural properties of the thin films.