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Antireflection of transparent polymers by advanced plasma etching procedures

: Schulz, U.; Munzert, P.; Leitel, R.; Wendling, I.; Kaiser, N.; Tünnermann, A.

Postprint (513 KByte; PDF; )

Optics Express 15 (2007), Nr.20, S.13108-13113
ISSN: 1094-4087
Zeitschriftenaufsatz, Elektronische Publikation
Fraunhofer IOF ()
antireflection; microstructure fabrication; deposition and fabrication

Self-organized nanostructures that provide antireflection properties grow on PMMA caused by plasma ion etching. A new procedure uses a thin initial layer prior to the etching step.
Different types of antireflective structures can now be produced in a shorter time and with fewer limitations on the type of polymer that can be used. The durability of the structured surfaces can be improved by the deposition of additional thin