Hier finden Sie wissenschaftliche Publikationen aus den Fraunhofer-Instituten.

Application of quantum cascade laser absorption spectroscopy for correlation studies in plasma etching processes in the semiconductor industry

: Lang, N.; Zimmermann, S.; Zimmermann, H.; Macherius, U.; Uhlig, B.; Schaller, M.; Schulz, S.E.; Röpcke, J.; Helden, J.H. van


Optical Society of America -OSA-, Washington/D.C.:
Mid-Infrared Coherent Sources : Part of High-Brightness Sources and Light-Driven Interactions; 26-28 March 2018, Strasbourg, France
Washington, DC: OSA, 2018
ISBN: 978-1-943580-40-8
Paper MT3C.2
Meeting "Mid-Infrared Coherent Sources" (MICS) <2018, Strasbourg>
Conference "High-Brightness Sources and Light-Driven Interactions" <2018, Strasbourg>
Fraunhofer ENAS ()

Applying quantum cascade laser absorption spectroscopy a correlation could be demonstrated between the concentration of the etching products SiF4 and CO and the etching rate of ultra-low-k SiCOH in a low-pressure rf plasma containing CF4.