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Mechanical stability of spatial light modulators in microlithography

: Dauderstädt, U.; Dürr, P.; Ljungblad, U.; Karlin, T.; Schenk, H.; Lakner, H.


Ürey, H. ; Society of Photo-Optical Instrumentation Engineers -SPIE-, Bellingham/Wash.:
MOEMS Display and Imaging Systems III : 24-25 January 2005, San Jose, California. Proceedings
Bellingham/Wash.: SPIE, 2005 (SPIE Proceedings Series 5721)
ISBN: 0-8194-5695-0
Conference on MOEMS Display and Imaging Systems <3, 2005, San Jose/Calif.>
Fraunhofer IPMS ()
optical MEMS; spatial light modulator; DUV; mechanical drift

The Fraunhofer IPMS and Micronic Laser Systems AB have developed a technology for microlithography using spatial light modulation (SLM). This technology uses an array of micromirrors as a programmable mask, which allows parallel writing of 1 million pixels with a frame rate of up to 2 kHz. The SLM is fabricated at the IPMS using its high-voltage CMOS process. The mirrors are fabricated by surface micromachining using a polymer as sacrificial layer. The mirrors are operated in an analog mode to allow sub-pixel placement of pattern features. This paper describes the function of the SLM with an emphasis on the stability of the mirror deflection and a method to improve it which has been implemented.