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Customized CMOS processes for optical sensing and imaging

 
: Spickermann, Andreas; Durini, Daniel

Fraunhofer-Institut für Optik und Feinmechanik -IOF-, Jena:
First International Symposium on Microoptical Imaging and Projection, MIP 2012. Proceedings : 27 - 29 November 2012, Jena, Germany
Jena: Fraunhofer IOF, 2012
S.82-85
International Symposium on Microoptical Imaging and Projection (MIP) <1, 2012, Jena>
Englisch
Konferenzbeitrag
Fraunhofer IMS ()
CMOS process for imaging; UV imaging; SPAD; LDPD; time-of-flight

Abstract
Fraunhofer IMS counts with more than 15 years of experience in what research and development of novel CMOS photodetectors and image sensors, their processing and characterisation are concerned. We offer CMOS post-processing services to our customers, which involve deposition of colour filters, microlenses and anti-reflection coatings, as well as stitching for large area sensors, wafer thinning, MEMS, or flipped-wafer or flipped-die bonding techniques. Our R&D activities cover parts of the spectra ranging from X-ray over EUV, UV, and the visible range up to near infrared.

: http://publica.fraunhofer.de/dokumente/N-225049.html