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Plasma-etched organic layers for antireflection purposes

 
: Schulz, U.; Präfke, C.; Gödeker, C.; Kaiser, N.; Tünnermann, A.

:

Applied optics 50 (2011), Nr.9, S.C31-C35
ISSN: 0003-6935
ISSN: 1539-4522
ISSN: 1559-128X
Englisch
Zeitschriftenaufsatz
Fraunhofer IOF ()

Abstract
Organic layers can be used to realize special functions in optical interference coatings. Suitable compounds for such layers were thermally evaporated and characterized. A plasma etching procedure was applied to produce nanostructures on top of the organic layers to reduce their effective refractive indices. Broadband antireflective coatings were obtained by combining these artificial low-index layers with conventionally prepared interference stacks.

: http://publica.fraunhofer.de/dokumente/N-142761.html