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Plasma surface modification of PMMA for optical applications

: Schulz, U.; Munzert, P.; Kaiser, N.


Journal of adhesion science and technology 24 (2010), Nr.7, S.1283-1289
ISSN: 0169-4243
Fraunhofer IOF ()
PMMA; antireflection; plasma surface modification

Optical surfaces with antireflective structures show excellent optical properties for a wide range of light incidence angles. Suitable structures can be generated on PMMA by an optimized plasma etching process. The chemical composition of PMMA modified using plasma was studied with infrared reflection absorption spectroscopy (IRRAS). The investigations indicate a change of chemical composition even during the first few seconds of plasma etching. It is assumed that the modified surface layer is essentially involved in the structure formation process.