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About the calibration of thickness standards on the nanometre scale

: Hasche, K.; Ulm, G.; Herrmann, K.; Krumrey, M.; Ade, G.; Stümpel, J.; Busch, I.; Thomsen-Schmidt, P.; Schädlich, S.; Schindler, A.; Frank, W.; Procop, M.; Beck, U.

European Society for Precision Engineering and Nanotechnology -EUSPEN-:
3rd international EUSPEN conference. Proceedings. CD-ROM : And 4th general meeting; Eindhoven, The Netherlands, May 26th - 30th, 2002
Eindhoven, 2002
ISBN: 90-386-2883-8
European Society for Precision Engineering and Nanotechnology (International Conference) <3, 2002, Eindhoven>
Fraunhofer IWS ()
standard; Geometrie; Nanomaterialien; Grenzfläche

Two different kinds of film thickness standards are created. One for typical X-ray methods, like X-ray reflectometry (XRR), X-ray fluorescence analysis (XRF) and electron probe microanalysis (EPMA). The calibration of thickness and evaluation of further parameters characterizing the artifact as reference standard base primarily on XRR. The second type of calibration standard is focussed on ellipsometry and has a small structure which allows scanning force microscopic (SFM) determination of the film thickness. A short survey on manufacturing and some results of characterization for both types of standards shall be communicated here.