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Optical coatings for UV photolithography systems

 
: Kaiser, N.; Bauer, H.H.; Heller, M.

France, C. ; Society of Photo-Optical Instrumentation Engineers -SPIE-, Bellingham/Wash.:
Developments in optical component coatings : Tagung 15-16 May 1996, Glasgow
Bellingham, Wash.: SPIE, 1996 (Europto series)
ISBN: 0-8194-2161-8
pp.353-365
Conference "Developments in Optical Component Coatings" <1996, Glasgow>
English
Conference Paper
Fraunhofer IOF ()
Dünne optische Schicht; excimer laser optics; Excimer-Laser-Optik; fluoride thin films; Fluoridschicht; laser induced damage threshold; Laserzerstörschwelle; optical coating; optical thin films; oxide thin films; Oxidschicht; ultraviolet spectral region; ultravioletter Spektralbereich; UV

Abstract
The performance of UV photolithography lens-systems with usually several ten optical components is limited by both the quality of the substrates and by the quality of the optical coatings. The key problems are the quality of the reflectance over large and strongly curved surfaces, the absorption and scatter losses and the behaviour during heavy UV irradiation in production lines.

: http://publica.fraunhofer.de/documents/PX-27310.html