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Excimer laser interaction with dielectric thin films

 
: Kaiser, N.; Welsch, E.; Ettrich, K.; Blaschke, H.

:

Applied surface science 96-98 (1996), pp.393-398
ISSN: 0169-4332
English
Journal Article
Fraunhofer IOF ()
Dünne optische Schicht; excimer laser optics; fluoride thin films; Fluoridschicht; laser induced damage threshold; Laserzerstörschwelle; optical coating; optical thin films; oxide thin films; Oxidschicht; ultraviolet spectral region; ultravioletter Spektralbereich; UV

Abstract
Utilizing thermal Mirage technique, UV laser damage resistivity studies on electron beam evaporeted LaF3/MgF2 and Al2O3/SiO2 reflecting multilayer stacks have been performed at lambda = 248 nm, tau = 20 ns. Investigating these stacks by changing the number of (H, L) pairs, different coating properties were shown to be responsible to UV single-shot laser damage. The high damage resistivity of the Al2O3/SiO2 multilayers is caused by low defect density, whereas the damage of LaF3/MgF2 stacks origins from defects which are incorporated in the layers during the deposition process.

: http://publica.fraunhofer.de/documents/PX-13370.html