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In-Situ Wafer Temperature Measurement During Firing Process via Inline Infrared Thermography

: Ourinson, D.; Emanuel, G.; Csordàs, A.; Dammaß, G.; Müller, H.; Sternkiker, C.; Clement, F.; Glunz, S.W.


Tous, L. ; American Institute of Physics -AIP-, New York:
8th Workshop on Metallization and Interconnection for Crystalline Silicon Solar Cells 2019. Proceedings : 13-14 May 2019, Konstanz, Germany
Woodbury, N.Y.: AIP, 2019 (AIP Conference Proceedings 2156)
ISBN: 978-0-7354-1901-8
Art. 020013, 8 pp.
Workshop on Metallization & Interconnection for Crystalline Silicon Solar Cells <8, 2019, Konstanz>
Conference Paper
Fraunhofer ISE ()
Photovoltaik; Silicium-Photovoltaik; Metallisierung; Strukturierung; Firing; Measurement; Thermography; Assurance; Belt Furnace

In this work, an inline IR thermography system as an innovative application for real-time contactless temperature measurement of wafers - both metallized and non-metallized - during the firing process has been successfully realized in an industrial firing furnace as proof-of-concept and example for a thermography system in a conveyor furnace. As observed by the new system, thermocouples seem to measure lower temperature on wafers - especially in combination with thermocouple-frames – than wafers exhibit at standard firing conditions (here up to ΔT ≈ 40 K). Further, highly resolved spatial temperature distribution could be successfully measured on the wafer.