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Quantitative comparison of measurement methods for the evaluation of micro- and nanostructures written with 2PP

: Harnisch, Emely Marie; König, Niels; Schmitt, Robert


Andrews, David L. ; Society of Photo-Optical Instrumentation Engineers -SPIE-, Bellingham/Wash.:
Nanophotonics VI : 3-7 April 2016, Brussels, Belgium
Bellingham, WA: SPIE, 2016 (Proceedings of SPIE 9884)
ISBN: 978-1-5106-0129-1
Paper 98842Z, 10 pp.
Conference "Nanophotonics" <6, 2016, Brussels>
Conference Paper
Fraunhofer IPT ()
two-photon polymerization; Micro- and Nanometrology; confocal microscopy; white light interferometry; scanning electron microscopy; atomic force microscopy; GageR&R Analysis; measurement system analysis

Two-Photon Polymerization (2PP) has become an established process for fabricating individual micro-and nanostructures nearly in the last two decades. Its high degree of freedom opened up novel possibilities for a large range of applications like functional structures for cell growth, photonic crystals, nanoantennas, diffractive optical elements and lab-on-a-chip structures (just to name a few). Since the measurement of structures written with 2PP is always very time consuming, we present a comparison between white light interferometry (WLI) and confocal microscopy (CM) which were used for measuring structures written with 2PP. By performing a GageR&R analysis with both metrology devices, we calculated the process tolerance one has to accept when measuring these structures with WLI or CM.