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Ion-assisted deposition processes: Industrial network IntIon

: Ehlers, H.; Becker, K.-J.; Beckmann, R.; Beermann, N.; Brauneck, U.; Fuhrberg, P.; Gäbler, D.; Jakobs, S.; Kaiser, N.; Kennedy, M.; König, F.; Laux, S.; Müller, J.C.; Rau, B.; Riggers, W.; Ristau, D.; Schäfer, D.; Stenzel, O.


Amra, C. ; Society of Photo-Optical Instrumentation Engineers -SPIE-, Bellingham/Wash.:
Advances in optical thin films : 30 September - 3 October 2003, St. Etienne, France
Bellingham/Wash.: SPIE, 2004 (SPIE Proceedings Series 5250)
ISBN: 0-8194-5134-7
Conference "Advances in Optical Thin Films" <2003, St. Etienne>
Conference Paper
Fraunhofer IOF ()
optical coating; ion assisted deposition; ion source; Nb2O5

The presented work is embedded in the research network "Integrative Ion Processes for Modern Optics", called IntIon, consisting of 12 partners from the German optics industry and two research institutes. The main target of the IntIon network is the development of new process concepts on the basis of ion assisted deposition (IAD) for the industrial production of optical thin film components. Besides an improvement in efficiency, a major aim is concentrated on the optical characteristics for selected application fields with high economical potential. In this network, different ion and plasma sources are compared with regard to their qualification for ion assisted deposition processes. This work includes the characterization of the ion energy and ion current using Faraday-cup measurements. The selection of investigated coating materials includes a broad variety of standard and non-standard oxides. First results of the network will be presented for adapted deposition materials and different operation characteristics of ion sources.