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Two-dimensional simulation methods (integrated optics)

: Nolting, H.-P.; Weinert, C.M.

Hard and Soft (1989), No.5-6, pp.XI-XII
ISSN: 0178-7586
Journal Article
Fraunhofer HHI ()
integrated optics; semiconductor epitaxial layers; semiconductor growth; semiconductor technology; 2d simulation methods; integrated optical components; semiconductors; iii-v components; grating-like quaternary epitaxial layers; lithography; etching; deposition; diffusion processes; numerical methods; inp; InGaAsP

The production of integrated optical components based on semiconductors involves elaborate procedures. This applies to the growing of III-V components such as InP, the generation of grating-like quaternary epitaxial layers (InGaAsP), and to the associated lithography, etching, deposition and diffusion processes. To minimise the number of these costly stages, the optimum design must be known as well as possible before production. To this end, numerical methods are used to simulate the functioning of the components.