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Two-dimensional arrays of diffractive microlenses for optical interconnects

: Kuhlow, B.; Pawlowski, E.; Ferstl, M.

Institution of Electrical Engineers -IEE-, London:
Fourth International Conference on Holographic Systems, Components and Applications : 13 - 15 September 1993; venue: Neuchatel, Switzerland
London: IEE, 1993 (IEE conference publication 379)
ISBN: 0-85296-578-8
International Conference on Holographic Systems, Components and Applications <4, 1993, Neuchâtel>
Conference Paper
Fraunhofer HHI ()
computer-generated holography; electron beam lithography; etching; holographic optical elements; lenses; masks; optical interconnections; optical links; optical switches; optical workshop techniques; optical zone plates; 2d arrays; dcg; electron beam writing; antireflection coating; linear volume gratings; fresnel zone plate lenses; anisotropic etching; optical interconnects; 16*16 diffractive optical microlenses; free space interconnection networks; electronic switching stages; glass substrates; microstructuring techniques; diffraction efficiency; tio2-sio2 layered system

Arrays of 16*16 diffractive optical microlenses are presented that are used in free space interconnection networks of electronic switching stages. They have been fabricated as 'binary optical elements' in glass substrates by microstructuring techniques. Individual elements have a diameter of 2 mm and 200 mu m and 16 levels per zone. Arrays with different F-number lenses for the two wavelengths 1.52 mu m and 0.63 mu m have been fabricated. In order to reduce reflection losses and cross talk in an interconnection network the lens arrays have been AR-coated with a two layer system of TiO2 and SiO2. The measured diffraction efficiency of the lenses with large F-numbers is 95%.