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Development of nanoimprint lithography for solar cell texturisation

: Hauser, H.; Michl, B.; Schwarzkopf, S.; Müller, C.; Hermle, M.; Bläsi, B.

Volltext urn:nbn:de:0011-n-1563936 (577 KByte PDF)
MD5 Fingerprint: dd098058d1e1d955f32b504ed5ba20fe
Erstellt am: 4.8.2012

European Commission:
25th European Photovoltaic Solar Energy Conference and Exhibition, EU PVSEC 2010. Proceedings : 5th World Conference on Photovoltaic Energy Conversion, 6-10 , September 2010, Valencia, Spain
München: WIP-Renewable Energies, 2010
ISBN: 3-936338-26-4
European Photovoltaic Solar Energy Conference and Exhibition (EU PVSEC) <25, 2010, Valencia>
World Conference on Photovoltaic Energy Conversion <5, 2010, Valencia>
Konferenzbeitrag, Elektronische Publikation
Fraunhofer ISE ()
Solarthermie und Optik; Silicium-Photovoltaik; Angewandte Optik und funktionale Oberflächen; Silicium-Photovoltaik; Oberflächen - Konditionierung; Passivierung; Lichteinfang; Thermische Solaranlagen

A novel processing scheme for the defined texturisation of silicon solar cells is presented. This process chain is based on nanoimprint lithography (NIL) to structure etching masks in combination with plasma etching processes for the pattern transfer into the silicon substrate. This process chain is intended for the honeycomb texturing of multicrystalline silicon solar cells. In this study we use high efficiency monocrystalline silicon to investigate the effect of the processes used without being limited by material related issues. Very high short circuit current densities exceeding 40 mA/cm² are demonstrated. Besides this proof of concept related studies, we report on our progress in developing a roller-NIL tool to allow a continuous process flow for structuring high-resolution etching masks.