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Using hotmelt-inkjet as a structuring method for higher efficiency industrial silicon solar cells

: Specht, J.; Biro, D.; Mingirulli, N.; Aleman, M.; Belledin, U.; Efinger, R.; Erath, D.; Gautero, L.; Lemke, A.; Stüwe, D.; Rentsch, J.; Preu, R.

Fulltext urn:nbn:de:0011-n-1720957 (3.1 MByte PDF)
MD5 Fingerprint: 8b61677fcb5f516ebe020684e41658fc
Created on: 21.9.2012

Society for Imaging Science and Technology -IS&T-; Imaging Society of Japan:
24th International Conference on Digital Printing Technologies and Digital Fabrication 2008 (NIP) : Pittsburgh, Pennsylvania, September 6-11, 2008
Springfield/Va., 2008
ISBN: 978-0-89208-279-7
International Conference on Digital Printing Technologies (NIP) <24, 2008, Pittsburgh/Pa.>
Conference Paper, Electronic Publication
Fraunhofer ISE ()

A procedure was developed to form openings in dielectric layers for subsequent contact formation based on inkjetting hydrocarbon wax. Basic investigations on the process focussing on obtaining the minimal feature size are presented. Continuous fine line openings below 20 m width in the mask were obtained, which allowed for wet chemical etching of the underlying anti-reflective coatings. Subsequently nickel and Silver plating were used to form ohmic contacts, leading to a width of the metallization of down to about 30 mu;m. The results were achieved on micro-structured silicon surfaces covered by a silicon nitride layer commonly used in the photovoltaic industry.