Fraunhofer-Gesellschaft

Publica

Hier finden Sie wissenschaftliche Publikationen aus den Fraunhofer-Instituten.
2021Atmospheric Pressure Dry Etching of Polysilicon Layers for highly Reverse Bias-stable TOPCon Solar Cells
Kafle, B.; Mack, S.; Teßmann, C.; Bashardoust, S.; Clochard, L.; Duffy, E.; Wolf, A.; Hofmann, M.; Rentsch, J.
Zeitschriftenaufsatz
2020On the Formation of Black Silicon Features by Plasma-Less Etching of Silicon in Molecular Fluorine Gas
Kafle, B.; Ridoy, A.I.; Miethig, E.; Clochard, L.; Duffy, E.; Hofmann, M.; Rentsch, J.
Zeitschriftenaufsatz
2020POCl3-Based Emitter Diffusion Process with Lower Recombination Current Density and Homogeneous Sheet Resistance for Nanotextured Monocrystalline Silicon with atmospheric Pressure Dry Etching
Khan, N.W.; Ridoy, A.I.; Kafle, B.; Klitzke, M.; Schmidt, S.; Clochard, L.; Wolf, A.; Hofmann, M.; Rentsch, J.
Konferenzbeitrag
2020Technological Viability and Proof-of-Concept of Applying Low-Temperature PECVD SiNx for Inkjet-Masked Selective Emitters
Kafle, B.; Demel, K.; Efinger, R.; Hofmann, M.; Shepherd, W.; Pickrell, M.; Keding, R.
Konferenzbeitrag
2019Inline Deposited PassDop Layers for Rear Side Passivation and Contacting of p-type c-Si PERL Solar Cells with High Bifaciality
Norouzi, M.H.; Saint-Cast, P.; Lohmüller, E.; Lohmüller, S.; Steinhauser, B.; Wolf, A.; Hofmann, M.
Konferenzbeitrag
2019Multivariate Statistical Modelling to Correlate PECVD Layer Properties with Plasma Chemistry during Silicon Nitride Deposition
Rachdi, L.; Hofmann, M.
Konferenzbeitrag
2019Plasma Oxidation for the Front Side Passivation of PERC Solar Cells
Mohamed Okasha Mohamed Okasha, A.; Kafle, B.; Torda, B.; Teßmann, C.; Moldovan, A.; Hofmann, M.
Konferenzbeitrag
2019Surface Passivation of Atmospheric Pressure Dry Etched Multicrystalline Silicon Surfaces
Ridoy, A.I.; Kafle, B.; Khan, N.W.; Klitzke, M.; Lohmüller, S.; Clochard, L.; Duffy, E.; Wolf, A.; Hofmann, M.
Konferenzbeitrag
2018Emitter Formation and Passivation Dependence on Crystal Grain Orientations after Atmospheric Pressure Dry Nanotexturing
Ridoy, A.I.; Kafle, B.; Saint-Cast, P.; Lohmüller, S.; Norouzi, M.H.; Clochard, L.; Duffy, E.; Hofmann, M.; Rentsch, J.; Preu, R.
Konferenzbeitrag
2018Fabrication of APCVD PSG Emitter-Based Industrial PERC Solar Cells Reaching >21.0% Conversion Efficiencies
Kafle, B.; Saint-Cast, P.; Belledin, U.; Lohmüller, S.; Zunft, H.; Knauss, H.; Palinginis, P.; Kusterer, C.; Köhler, R.; Zehl, T.; Wolf, A.; Hofmann, M.
Konferenzbeitrag
2018High-Efficiency Diamond Wire-Sawn mc-Si-Based PERC Solar Cells Textured by Atmospheric Pressure Dry Etching
Kafle, B.; Ridoy, A.I.; Saint-Cast, P.; Clochard, L.; Duffy, E.; Duncker, K.; Petter, K.; Peters, S.; Hofmann, M.
Konferenzbeitrag
2018Selective Emitter Using APCVD PSG Layer as Doping Source
Saint-Cast, P.; Belledin, U.; Lohmüller, E.; Kafle, B.; Weber, J.; Seren, S.; Lohmüller, S.; Wolf, A.; Hofmann, M.
Konferenzbeitrag
2013High-power-plasma PECVD of SiNx and Al2O3 for industrial solar cell manufacturing
Hofmann, M.; Kohn, N.; Schwarz, F.; Nölker, S.; Kastl, S.; Beckmann, R.; Ferré, R.; Pernau, T.; Trogus, D.; Kühnhold, S.; Saint-Cast, P.; Rentsch, J.
Konferenzbeitrag
2013Industrial screen-printed solar cells with novel atmospheric pressure dry texturing process
Kafle, B.; Trogus, D.; Dresler, B.; Mäder, G.; Clochard, L.; Duffy, E.; Hofmann, M.; Rentsch, J.
Konferenzbeitrag
2013Potential-induced degradation on cell level: The inversion model
Saint-Cast, P.; Nagel, H.; Wagenmann, D.; Schön, J.; Schmitt, P.; Reichel, C.; Glunz, S.W.; Hofmann, M.; Rentsch, J.; Preu, R.
Konferenzbeitrag
2013Two-step plasma texturing process for industrial solar cell manufacturing
Seiffe, J.; Bremen, B.; Rappl, S.; Hofmann, M.; Rentsch, J.
Konferenzbeitrag
2012Advanced anti-reflection and passivation layer systems produced by high-power plasma in the new manz PECVD system
Schwarz, F.; Beckmann, R.; Kohn, N.; Nölker, S.; Kastl, S.; Hofmann, M.; Ferré, R.; Pernau, T.; Wanka, H.; Rentsch, J.
Konferenzbeitrag
2012Analysis of phosphorus doped silicon oxide layers deposited by means of PECVD as a dopant source in diffusion processes
Fallisch, A.; Wagenmann, D.; Keding, R.; Trogus, D.; Hofmann, M.; Rentsch, J.; Reinecke, H.; Biro, D.
Zeitschriftenaufsatz
2012Cost modeling of silicon solar cell production innovation along the PV value chain
Nold, S.; Voigt, N.; Friedrich, L.; Weber, D.; Hädrich, I.; Mittag, M.; Wirth, H.; Thaidigsmann, B.; Hofmann, M.; Rentsch, J.; Preu, R.
Konferenzbeitrag
2012Inkjet-printed diffusion barrier for structured doping areas from doped PECVD silicate glasses
Stüwe, D.; Keding, R.; Hahn, D.; Jahn, M.; Fallisch, A.; Clement, F.; Hofmann, M.; Woehl, R.; Biro, D.; Tueshaus, C.; Doll, O.; Stockum, W.; Koehler, I.
Konferenzbeitrag
2012Inline microwave-excited plasma deposition of thin amorphous silicon layers
Jeurink, J.; Morzè, N. von; Kroely, L.; Hofmann, M.; Rentsch, J.; Preu, R.
Konferenzbeitrag
2012Multifunctional PECVD layers - cost analysis of the X-pert approach
Seiffe, J.; Nold, S.; Hofmann, M.; Rentsch, J.; Preu, R.
Konferenzbeitrag
2012A review of PECVD aluminum oxide for surface passivation
Saint-Cast, P.; Hofmann, M.; Kühnhold, S.; Kania, D.; Weiss, L.; Heo, Y.-H.; Billot, E.; Olwal, P.; Trogus, D.; Rentsch, J.; Preu, R.
Konferenzbeitrag
2012Silicon doping performed by different diffusion sources aiming co-diffusion
Keding, R.; Rothhardt, P.; Roters, C.; Fallisch, A.; Hohage, S.; Hofmann, M.; Woehl, R.; Borchert, D.; Biro, D.
Konferenzbeitrag
2012Thermal stability investigations of PECVD Al2O3 films discussing a possibility of improving surface passivation by re-hydrogenation after high temperature processes
Kafle, B.; Kühnhold, S.; Beyer, W.; Lindekugel, S.; Saint-Cast, P.; Hofmann, M.; Rentsch, J.
Konferenzbeitrag
2011Diffusion and Characterization of Doped Patterns in Silicon from Prepatterned Boron- and Phosphorus-Doped Silicate Glasses
Keding, R.; Woehl, R.; Stüwe, D.; Fallisch, A.; Hofmann, M.; Rentsch, J.; Biro, D.
Konferenzbeitrag
2011Increased Ion Energies for Texturing in a High-Throughput Plasma Tool
Piechulla, P.; Seiffe, J.; Hofmann, M.; Rentsch, J.; Preu, R.
Konferenzbeitrag
2011Interface Characterization of Dry-Etched Emitters
Clement, C.; Seiffe, J.; Hofmann, M.; Rentsch, J.; Preu, R.; Naumann, V.; Werner, M.
Konferenzbeitrag
2011Investigations on the Impact of Wafer Grippers on Optical and Electrical Properties of Alkaline Textured and A-Si Passivated Surfaces
Nold, S.; Aßmus, M.; Weil, A.; Haunschild, J.; Savio, C.; Hofmann, M.; Rentsch, J.; Preu, R.; Kunz, M.
Konferenzbeitrag
2011Phosphoric Anti-Reflective Coatings as Dopant Source and Front-Side Passivation for Industrial Silicon Solar Cell Manufacturing
Trogus, D.; Seiffe, J.; Pillath, F.; Hofmann, M.; Wolf, A.; Rentsch, J.
Konferenzbeitrag
2011Plasma Deposition of a Amorphous Silicon Dopant Sources
Jeurink, J.; Seiffe, J.; Hofmann, M.; Rentsch, J.; Preu, R.
Konferenzbeitrag
2011Surface Passivation of Highly and Lowly Doped P-Type Silicon Surfaces with PECVD Al2O3 for Industrially Applicable Solar Cell Concepts
Saint-Cast, P.; Billot, E.; Olwal, P.; Kühnhold, S.; Richter, A.; Hofmann, M.; Rentsch, J.; Preu, R.
Konferenzbeitrag
2010Comparison of different rear contacting approaches for industrial PERC solar cells on MC-SI wafer
Gautero, L.; Kania, D.; Seiffe, J.; Knorz, A.; Specht, J.; Nekarda, J.; Hofmann, M.; Rentsch, J.; Sallese, J.-M.; Preu, R.
Konferenzbeitrag
2010Effizienzoptimierung integrierter elektrischer Antriebssysteme für Hybrid- und Elektrofahrzeuge
Hofmann, M.; Eckardt, B.; März, M.; Frey, L.
Konferenzbeitrag
2010Front surface passivation for industrial-type solar cells by silicon oxynitride - silicon nitride stacks
Schwab, C.; Hofmann, M.; Rentsch, J.; Preu, R.
Konferenzbeitrag
2010High efficiency p-type PERC solar cells applying PECVD ALOx layers
Saint-Cast, P.; Benick, J.; Kania, D.; Billot, E.; Richter, A.; Hermle, M.; Hofmann, M.; Rentsch, J.; Preu, R.; Glunz, S.W.
Konferenzbeitrag
2010High temperature stability of PECVD aluminium oxide layers applied as negatively charged passivation on c-Si surfaces
Kania, D.; Saint-Cast, P.; Hofmann, M.; Rentsch, J.; Preu, R.
Konferenzbeitrag
2010Improved emitters by dry etching
Seiffe, J.; Khandelwal, R.; Clement, C.; Jäger, U.; Hofmann, M.; Rentsch, J.; Preu, R.
Konferenzbeitrag
2010Industrial deposition of PECVD AIOx for rear passivation of PERC-type mc-SI solar cells
Rentsch, J.; Sperlich, H.-P.; Kohn, N.; Kania, D.; Saint-Cast, P.; Schetter, C.; Hofmann, M.; Preu, R.
Konferenzbeitrag
2010P-type Cz-Si PERC-type solar cells applying PECVD aluminium oxide rear surface passivation
Saint-Cast, P.; Kania, D.; Billot, E.; Weiss, L.; Hofmann, M.; Gautero, L.; Kohn, N.; Biro, D.; Rentsch, J.; Preu, R.
Konferenzbeitrag
2010Plasma single-sided etching for rear emitter etch-back and flattening of industrial crystalline silicon solar cells
Khandelwal, R.; Hofmann, M.; Trogus, D.; Gautero, L.; Seiffe, J.; Rentsch, J.; Preu, R.
Konferenzbeitrag
2009All-screen-printed 120-µM-thin large-area silicon solar cells applying dielectric rear passivation and laser-fired contacts reaching 18% efficiency
Gautero, L.; Hofmann, M.; Rentsch, J.; Lemke, A.; Mack, S.; Seiffe, J.; Nekarda, J.; Biro, D.; Wolf, A.; Bitnar, B.; Sallese, J.M.; Preu, R.
Konferenzbeitrag
2009Firing stable passivation with a-Si/SiNx stack layers for crystalline silicon solar cells
Saint-Cast, P.; Hofmann, M.; Dimitrova, T.; Wagenmann, D.; Rentsch, J.; Preu, R.
Konferenzbeitrag
2009Industrial negatively charged c-Si surface passivation by inline PECVD AlOx
Kania, D.; Saint-Cast, P.; Wagenmann, D.; Hofmann, M.; Rentsch, J.; Preu, R.
Konferenzbeitrag
2009Overview on crystalline silicon solar cells using PECVD rear passivation and laser-fired contacts
Hofmann, M.; Saint-Cast, P.; Suwito, D.; Seiffe, J.; Schmidt, C.; Kambor, S.; Gautero, L.; Kohn, N.; Nekarda, J.-F.; Leimenstoll, A.; Wagenmann, D.; Erath, D.; Catoir, J.; Wolke, W.; Janz, S.; Biro, D.; Grohe, A.; Rentsch, J.; Glunz, S.W.; Preu, R.
Konferenzbeitrag
2009Relevant pinhole characterisation methods for dielectric layers for silicon solar cells
Saint-Cast, P.; Tanay, F.; Aleman, M.; Reichel, C.; Bartsch, J.; Hofmann, M.; Rentsch, J.; Preu, R.
Konferenzbeitrag
2009A review on 5 years cell development within the european integrated project crystal clear
John, J.; Beaucarne, G.; Choulat, P.; Ma, Y.; Russell, R.; Romijn, I.; Lamers, M.; Mewe, A.; Weeber, A.; Hofmann, M.; Preu, R.; Gautero, J.; Slaoui, A.; Quang, A.Q. le; Nichiporuk, O.; Canizo, C. del; Pan, A.; Solheim, H.; Evju, J.; Nagel, H.; Bitnar, B.; Heemeier, M.; Weber, T.; Kaes, M.; Raabe, B.; Haverkamp, H.; Struempel, C.; Hahn, G.
Konferenzbeitrag
2009Thermal oxidation as a key technology for high efficiency screen printed industrial silicon solar cells
Biro, D.; Mack, S.; Wolf, A.; Lemke, A.; Belledin, U.; Erath, D.; Holzinger, B.; Wotke, E.A.; Hofmann, M.; Gautero, L.; Nold, S.; Rentsch, J.; Preu, R.
Konferenzbeitrag
2009Thermal stability of PECVD a-Si:H single and PECVD a-Si:H + PECVD a-SiOx:H double layers for silicon solar cell rear side passivation
Hofmann, M.; Schmidt, C.; Raabe, B.; Rentsch, J.; Preu, R.
Konferenzbeitrag
2009Thermally activated p- and n-doped passivation layers
Seiffe, J.; Suwito, D.; Korte, L.; Hofmann, M.; Janz, S.; Rentsch, J.; Preu, R.
Konferenzbeitrag
2009Towards a-Si:H rear passivated industrial-type silicon solar cells
Hofmann, M.; Saint-Cast, P.; Bareis, D.; Wagenmann, D.; Rentsch, J.; Preu, R.
Konferenzbeitrag
2008Industrial type CZ silicon solar cells with screen-printed fine line front contacts and passivated rear contacted by laser firing
Hofmann, M.; Erath, D.; Bitnar, B.; Gautero, L.; Nekarda, J.; Grohe, A.; Biro, D.; Rentsch, J.; Preu, R.
Konferenzbeitrag
2008IV measurements of mc-Si solar cells: Comparison of results from institute and industry partners within the EU crystalclear project
Hahn, G.; Herguth, A.; Helfricht, A.; Hofmann, M.; Warta, W.; Borg, N.J.C.M. van der; Weeber, A.W.; John, J.; Beaucarne, G.; Bagus, S.; Nagel, H.; Quang, N. le; Nichiporuk, O.; Vincueria, I.; Brochs, M.
Konferenzbeitrag
2008Plasma cluster processing for advanced solar cell manufacturing
Rentsch, J.; Seiffe, J.; Walter, F.; Hofmann, M.; Weiss, L.; Gautero, L.; Decker, D.; Schlemm, H.; Preu, R.
Konferenzbeitrag
2008Single side etching - key technology for industrial high efficiency processing
Rentsch, J.; Gautero, L.; Lemke, A.; Eigner, S.; Zimmer, M.; Walter, F.; Hofmann, M.; Preu, R.
Konferenzbeitrag
2008Solar cell process development in the european integrated project crystalclear
Beaucarne, G.; John, J.; Choulat, P.; Ma, Y.; Russel, R.; Romijn, I.; Weeber, A.; Hofmann, M.; Preu, R.; Slaoui, A.; Quang, N. le; Nichiporuk, O.; Canizo, C. del; Pan, A.; Solheim, H.; Evju, J.; Nagel, H.; Horzel, J.; Bitnar, B.; Heemeier, M.; Weber, T.; Raabe, B.; Haverkamp, H.; Strümpel, C.; Junge, J.; Riegel, S.; Seren, S.; Hahn, G.
Konferenzbeitrag
2007Detailed analysis of amorphous silicon passivation layers deposited in industrial in-line and laboratory-type PECVD reactors
Hofmann, M.; Schmidt, C.; Kohn, N.; Grambole, D.; Rentsch, J.; Glunz, S.W.; Preu, R.
Konferenzbeitrag
2007Firing stable surface passivation using all-PECVD stacks of SiOx:H and SiNx:H
Hofmann, M.; Kambor, S.; Schmidt, C.; Grambole, D.; Rentsch, J.; Glunz, S.W.; Preu, R.
Konferenzbeitrag
2007Industrial realization of dry plasma etching for PSG removal and rear side emitter etching
Rentsch, J.; Decker, D.; Hofmann, M.; Schlemm, H.; Roth, K.; Preu, R.
Konferenzbeitrag
2007Lifetime studies on laser drilled vias for application in emitter-wrap-through-solar cells
Mingirulli, N.; Grohe, A.; Dohrn, A.; Hofmann, M.; Schubert, M.; Roth, T.; Biro, D.; Preu, R.
Konferenzbeitrag
200621%-efficient silicon solar cells using amorphous silicon rear side passivation
Hofmann, M.; Glunz, S.; Preu, R.; Willeke, G.
Konferenzbeitrag
2006Surface passivation of silicon solar cells using amorphous silicon carbide layers
Glunz, S.W.; Janz, S.; Hofmann, M.; Roth, T.; Willeke, G.
Konferenzbeitrag
2005Biological and chemical entity recognition from text using conditional random fields (CRF)
Revillion, T.; Friedrich, C.M.; Fluck, J.; Hofmann, M.
Poster
2005Comparison of different dielectric passivation layers for application in industrially feasible high-efficiency crystalline silicon solar cells
Glunz, S.W.; Grohe, A.; Hermle, M.; Hofmann, M.; Janz, S.; Roth, T.; Schultz, O.; Vetter, M.; Martin, I.; Ferré, R.; Bermejo, S.; Wolke, W.; Warta, W.; Preu, R.; Willeke, G.
Konferenzbeitrag
2005Silicon oxide/silicon nitride stack system for 20% efficient silicon solar cells
Schultz, O.; Hofmann, M.; Glunz, S.W.; Willeke, G.P.
Konferenzbeitrag
2005Status and advancement in transferring the laser-fired contact technology to screen-printed silicon solar cells
Schneiderlöchner, E.; Grohe, A.; Fleischhauer, B.; Hofmann, M.; Glunz, S.W.; Preu, R.; Willeke, G.
Konferenzbeitrag
2004Silicon nitride - silicon oxide stacks for solar cell rear side passivation
Hofmann, M.; Schneiderlöchner, E.; Wolke, W.; Preu, R.
Konferenzbeitrag
2003Technology path to the industrial production of highly efficient and thin c-Si solar cells
Preu, R.; Biro, D.; Emanuel, G.; Grohe, A.; Hofmann, M.; Huljic, D.M.; Reis, I.E.; Rentsch, J.; Schneiderlöchner, E.; Sparber, W.; Wolke, W.; Willeke, G.
Konferenzbeitrag