Fraunhofer-Gesellschaft

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Hier finden Sie wissenschaftliche Publikationen aus den Fraunhofer-Instituten.
20113D simulation of sputter etching with the Monte-Carlo approach
Kunder, D.
Dissertation
2010Coupling of Monte Carlo sputter simulation and feature-scale profile simulation and application to the simulation of back etching of an intermetal dielectric
Baer, E.; Kunder, D.; Lorenz, J.; Sekowski, M.; Paschen, Uwe
Konferenzbeitrag
2010Simulation of focused ion beam etching by coupling a topography simulator and a Monte-Carlo sputtering yield simulator
Kunder, D.; Baer, E.; Sekowski, M.; Pichler, P.; Rommel, M.
Zeitschriftenaufsatz, Konferenzbeitrag
2007Atmospheric-pressure plasmas for wide-area thin-film deposition and etching
Hopfe, V.; Sheel, D.W.
Zeitschriftenaufsatz
20043D feature-scale simulation of sputter etching with coupling to equipment simulation
Bär, E.; Lorenz, J.; Ryssel, H.
Konferenzbeitrag
2002Highly selective etching of deep silica components using electron cyclotron resonance plasma
Ferstl, M.
Zeitschriftenaufsatz
2002Investigation of macroscopic uniformity during CH4/H2 reactive ion etching of InP and its improvement by use of a guard ring
Janiak, K.; Niggebrugge, U.
Zeitschriftenaufsatz
2001Fabrication of InGaAsP/InP ridge waveguide lasers with dry etched facets using chemically assisted ion beam etching and a simple photoresist mask
Paraskevopoulos, A.; Hensel, H.-J.; Molzow, W.-D.; Janiak, K.; Suryaputra, E.; Roehle, H.; Wolfram, P.; Ebert, W.
Konferenzbeitrag
2001Micro-optical elements fabricated by electron-beam lithography and dry etching technique using top conductive coatings
Steingrüber, R.; Ferstl, M.; Pilz, W.
Konferenzbeitrag, Zeitschriftenaufsatz
2000Flexible, reliable and simple fabrication of integrated spot size converters with shifting mask technique
Steingrüber, R.; Trommer, D.; Kaiser, R.; Pfeiffer, K.; Tiedke, I.
Konferenzbeitrag, Zeitschriftenaufsatz
2000Hydrogen passivation in InP:Zn resulting from reactive ion etching during laser stripe formation
Kreissl, J.; Moehrle, M.; Sigmund, A.; Bochnia, R.; Harde, P.; Ulrici, W.
Konferenzbeitrag
2000MOMBE selective infill growth of InP/GaInAs for quantum dot formation
Gibis, R.; Schelhase, S.; Steingrüber, R.; Urmann, G.; Kunzel, H.; Thiel, S.; Stier, O.; Bimberg, D.
Konferenzbeitrag, Zeitschriftenaufsatz
2000Three-dimensional microstructure elements fabricated by electron beam lithography and dry etching technique
Steingrüber, R.; Ferstl, M.
Konferenzbeitrag, Zeitschriftenaufsatz
1999Characterization of oxide etching and wafer cleaning using vapor phase anhydrous hydrofluoric acid and ozone
Bauer, A.J.; Froeschle, B.; Beichele, M.; Ryssel, H.
Konferenzbeitrag
1999Impurity incorporation during beam assisted processing analyzed using nuclear microprobe
Park, Y.K.; Takai, M.; Lehrer, C.; Frey, L.; Ryssel, H.
Zeitschriftenaufsatz, Konferenzbeitrag
1998Surface-micromachined electrostatic microrelay
Schiele, I.; Huber, J.; Hillerich, B.; Kozlowski, F.
Konferenzbeitrag
1997Highly reproducible and defect-free MOVPE overgrowth of InGaAsP-based DFB gratings
Franke, D.; Roehle, H.
Konferenzbeitrag, Zeitschriftenaufsatz
1996Investigation of macroscopic uniformity during CH4/H2 reactive ion etching of InP and improvement using a guard ring
Janiak, K.; Niggebrugge, U.
Konferenzbeitrag
1996Numerical modelling of charged particle motion in electric and magnetic fields to assist magnetron design
Liebig, J.-S.; Frach, P.; Bartzsch, H.; Schulze, D.; Schwanbeck, H.
Konferenzbeitrag
1996Polarization independent integrated mode transformer for uncladded InGaAsP/InP rib waveguides without epitaxial regrowth
Albrecht, P.; Heidrich, H.; Löffler, R.; Mörl, L.; Reier, F.; Weinert, C.M.
Konferenzbeitrag
1995Chemical analysis of a C12/BCl3/IBr3 chemically assisted ion-beam etching process for GaAs and InP laser-mirror fabrication under cryo-pumped ultrahigh vacuum conditions
Daleiden, J.; Eisele, K.; Sah, R.E.; Schmidt, K.H.; Ralston, J.D.
Zeitschriftenaufsatz
1995Novel high density plasma tool for large area flat panel display etching
Heinrich, F.; Bänzinger, U.; Jentzsch, A.; Neumann, G.; Huth, C.
Konferenzbeitrag
1994Plasma-deposited fluorocarbon coatings for passive and active integrated optical devices
Wirges, W.; Bauer-Gogonea, S.; Bauer, S.; Gerhard-Multhaupt, R.; Martinu, L.; Klemberg-Sapieha, J.E.; Wertheimer, M.R.
Konferenzbeitrag
1993AR-coated arrays of binary lenses for interconnection networks at 1.5 mu m
Ferstl, M.; Kuhlow, B.; Pawlowski, E.
Zeitschriftenaufsatz, Konferenzbeitrag
1993Blazed Fresnel zone lenses approximated by discrete step profiles: Effects of fabrication errors
Ferstl, M.; Kuhlow, B.; Pawlowski, E.
Konferenzbeitrag
1993In situ SIMS monitoring for ion beam etching of III-V semiconductor compounds and metal contacts
Hensel, H.J.; Paraskevopoulos, A.; Mörl, L.; Hase, A.; Böttcher, J.
Konferenzbeitrag
1993Simulation of time depending particle transport during dry etch processes
Börnig, K.; Pelka, J.
Konferenzbeitrag
1992Passivation effects in novolak based resists during O2-RIE
Jagdhold, U.; Pelka, J.
Konferenzbeitrag
1991Recent advances in dry etching processes for InP-based materials
Niggebrugge, U.
Konferenzbeitrag
1991A reliable fabrication technique for very low resistance ohmic contacts to p-InGaAs using low energy Ar+ ion beam sputtering
Stareev, G.; Umbach, A.; Fidorra, F.; Roehle, H.
Konferenzbeitrag
1990Control of a reactive ion etching process for InP and related materials by in-situ ellipsometry in the near infrared
Muller, R.
Konferenzbeitrag
1990Dry chemical etching processes for the production of InP-based components
Niggebrugge, U.; Muller, R.
Konferenzbeitrag
1990In situ etching depth monitoring for reactive ion etching of InGaAs(P)/InP heterostructures by ellipsometry
Muller, R.
Zeitschriftenaufsatz
1990Ion projection lithography - electronic alignment and dry development of IPL exposed resist materials
Buchmann, L.-M.; Heuberger, A.; Fallmann, W.; Paschke, F.; Stangl, G.; Chalupka, A.; Fegerl, J.; Löschner, H.; Malek, L.; Nowak, R.; Stengl, G.; Traher, C.; Wolf, P.; Fischer, R.
Zeitschriftenaufsatz
1990Profile evolution in the multilevel technique
Pilz, W.; Pelka, J.
Konferenzbeitrag
1989Endpoint detection for CH4/H2 reactive ion etching of InGaAsP heterostructures by mass spectrometry
Schmid, H.; Fidorra, F.; Grutzmacher, D.
Konferenzbeitrag
1989Microstructuring in semiconductor technology
Mader, H.
Konferenzbeitrag
1987Plasma mass spectrometric analysis and control of reactive ion etching of InP and related compounds
Schmid, H.
Konferenzbeitrag
1986A novel process for reactive ion etching on InP, using CH4/H2
Niggebrugge, U.; Klug, M.; Garus, G.
Konferenzbeitrag
1986Reactive ion beam etching of InP with N2 and N2/O2 mixtures
Katzschner, W.; Niggebrügge, U.; Löffler, R.; Schroeter-Janssen, H.
Zeitschriftenaufsatz
1984Ion beam milling of InP with an Ar/O2-gas mixture
Katzchner, W.; Steckenborn, A.; Löffler, R.; Grote, N.
Zeitschriftenaufsatz