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Hier finden Sie wissenschaftliche Publikationen aus den Fraunhofer-Instituten.
2015Plasma enhanced chemical vapour deposition (PECVD) at atmospheric pressure (AP) of organosilicon films for adhesion promotion on Ti15V3Cr3Sn3Al and Ti6Al4V
Haag, Jana; Mertens, Tobias; Kolb, Max; Kotte, Liliana; Kaskel, Stefan
Zeitschriftenaufsatz
2013Atmospheric pressure PECVD based on a linearly extended DC arc for adhesion promotion applications
Kotte, L.; Althues, H.; Mäder, G.; Roch, J.; Kaskel, S.; Dani, I.; Mertens, T.; Gammel, F.J.
Zeitschriftenaufsatz