Fraunhofer-Gesellschaft

Publica

Hier finden Sie wissenschaftliche Publikationen aus den Fraunhofer-Instituten.
2013Evaluation of resistless Ga+ beam lithography for UV NIL stamp fabrication
Rumler, Maximilian; Fader, Robert; Haas, Anke; Rommel, Mathias; Bauer, Anton; Frey, Lothar
Zeitschriftenaufsatz
2013Processing of silicon nanostructures by Ga+ resistless lithography and reactive ion etching
Rommel, M.; Rumler, M.; Haas, A.; Bauer, A.J.; Frey, L.
Zeitschriftenaufsatz
2010Aligned diamond nano-wires: Fabrication and characterisation for advanced applications in bio- and electrochemistry
Smirnov, W.; Kriele, A.; Yang, N.; Nebel, C.E.
Zeitschriftenaufsatz
2002Investigation of macroscopic uniformity during CH4/H2 reactive ion etching of InP and its improvement by use of a guard ring
Janiak, K.; Niggebrugge, U.
Zeitschriftenaufsatz
2000Hydrogen passivation in InP:Zn resulting from reactive ion etching during laser stripe formation
Kreissl, J.; Moehrle, M.; Sigmund, A.; Bochnia, R.; Harde, P.; Ulrici, W.
Konferenzbeitrag
2000MOMBE selective infill growth of InP/GaInAs for quantum dot formation
Gibis, R.; Schelhase, S.; Steingrüber, R.; Urmann, G.; Kunzel, H.; Thiel, S.; Stier, O.; Bimberg, D.
Konferenzbeitrag, Zeitschriftenaufsatz
1998Dielectric micro-filters for locally resolving color sensors
Frank, M.; Schallenberg, U.B.; Kaiser, N.; Buß, W.
Zeitschriftenaufsatz
1998Low-loss polymer waveguide with high thermal stability
Wirges, H.; Keil, N.; Yao, H.H.; Yilmaz, S.; Zawadzki, C.; Bauer, M.; Bauer, J.; Dreyer, C.
Konferenzbeitrag
1998Multispectral dielectric microfilter arrays for local resolving color sensors
Frank, M.; Schallenberg, U.B.; Kaiser, N.
Zeitschriftenaufsatz
1998Selective infill metalorganic molecular beam epitaxy of InP:Si n+/n- layers for buried collector double heterostructure bipolar transistors
Schelhase, S.; Bottcher, J.; Gibis, R.; Harde, P.; Paraskevopoulos, A.; Kunzel, H.
Zeitschriftenaufsatz
1997Dielectric microfilter arrays for multispectral measuring devices
Frank, M.; Schallenberg, U.; Kaiser, N.; Buss, W.
Konferenzbeitrag
1997Highly reproducible and defect-free MOVPE overgrowth of InGaAsP-based DFB gratings
Franke, D.; Roehle, H.
Konferenzbeitrag, Zeitschriftenaufsatz
1994Plasma-deposited fluorocarbon coatings for passive and active integrated optical devices
Wirges, W.; Bauer-Gogonea, S.; Bauer, S.; Gerhard-Multhaupt, R.; Martinu, L.; Klemberg-Sapieha, J.E.; Wertheimer, M.R.
Konferenzbeitrag
1993Electronic study of plasma-induced damage in GaAs heterostructures.
Zappe, H.P.
Zeitschriftenaufsatz
1990Hydrogen passivation of Zn acceptors in InGaAs during reactive ion etching
Moehrie, M.
Zeitschriftenaufsatz
1990In situ etching depth monitoring for reactive ion etching of InGaAs(P)/InP heterostructures by ellipsometry
Muller, R.
Zeitschriftenaufsatz
1990Influence of dry etch conditions on the properties of Schottky contacts to n-GaAs
Pletschen, W.; Bachem, K.H.; Hornung, J.; Kaufel, G.; Köhler, K.
Konferenzbeitrag
1990Influence of plasma and ion beams on the electrical properties on n-GaAs Schottky diodes.
Pletschen, W.; Bachem, K.H.
Zeitschriftenaufsatz
1990Influence of RIE- induced damage on luminescence and electron transport properties of AlGaAs-GaAs heterostructures.
As, D.J.; Kaufel, G.; Köhler, K.; Rothemund, W.; Zappe, H.P.; Jantz, W.; Schweizer, T.; Frey, T.
Zeitschriftenaufsatz
1989Endpoint detection for CH4/H2 reactive ion etching of InGaAsP heterostructures by mass spectrometry
Schmid, H.; Fidorra, F.; Grutzmacher, D.
Konferenzbeitrag
1987Plasma mass spectrometric analysis and control of reactive ion etching of InP and related compounds
Schmid, H.
Konferenzbeitrag
1987Self-aligned waveguide mirrors for optical integration on InGaAsP/InP
Albrecht, P.; Doldissen, W.; Niggerbrugge, U.; Nolting, H.P.; Schmid, H.
Konferenzbeitrag
1986A novel process for reactive ion etching on InP, using CH4/H2
Niggebrugge, U.; Klug, M.; Garus, G.
Konferenzbeitrag