Fraunhofer-Gesellschaft

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Hier finden Sie wissenschaftliche Publikationen aus den Fraunhofer-Instituten.
2019Microstructural control of a SSZ-13 zeolite film via rapid thermal processing
Kim, Jinseong; Jang, Eunhee; Hong, Sungwon; Kim, Dongjae; Kim, Eunjoo; Richter, Hannes; Simon, Adrian; Choi, Nakwon; Korelskiy, Danil; Fouladvand, Shahpar; Nam, Jaewook; Choi, Jungkyu
Zeitschriftenaufsatz
2014Novel generation of kiln furniture
Scheithauer, Uwe; Freytag, Christian; Haderk, Kristin; Moritz, Tassilo; Zins, Michael; Michaelis, Alexander
Konferenzbeitrag
2002Record fast thermal processing of 17.5 % efficient silicon solar cells
Peters, S.; Ballif, C.; Borchert, D.; Schindler, R.; Warta, W.; Willeke, G.
Zeitschriftenaufsatz
1999Characterization of oxide etching and wafer cleaning using vapor phase anhydrous hydrofluoric acid and ozone
Bauer, A.J.; Froeschle, B.; Beichele, M.; Ryssel, H.
Konferenzbeitrag
1999Reliability of ultra-thin gate oxides grown in low-pressure N20 ambient or on nitrogen-implanted silicon
Bauer, A.J.; Beichele; Herden, M.; Ryssel, H.
Konferenzbeitrag
1997Titanium monophosphide (TiP) layers as potential diffusion barriers
Leutenecker, R.; Fröschle, B.; Ramm, P.
Konferenzbeitrag
1997Titanium monophosphide (TiP) layers as potential diffusion barriers
Leutenecker, R.; Fröschle, B.; Ramm, P.
Konferenzbeitrag
1993A controllable mechanism of forming extremely low-resistance nonalloyed ohmic contacts to group III-V compound semiconductors
Stareev, G.; Kunzel, H.; Dortmann, G.
Zeitschriftenaufsatz
1993Optisches Prozessieren
Eyer, A.; Räuber, A.
Konferenzbeitrag
1993Tunneling behavior of extremely low resistance nonalloyed Ti/Pt/Au contacts to n(p)-InGaAs and n-InAs/InGaAs
Stareev, G.; Kunzel, H.
Zeitschriftenaufsatz
1991A reliable fabrication technique for very low resistance ohmic contacts to p-InGaAs using low energy Ar+ ion beam sputtering
Stareev, G.; Umbach, A.; Fidorra, F.; Roehle, H.
Konferenzbeitrag