Fraunhofer-Gesellschaft

Publica

Hier finden Sie wissenschaftliche Publikationen aus den Fraunhofer-Instituten.
2003New laboratory EUV reflectometer for large optics using a laser plasma source
Loyen, L. van; Böttger, T.; Braun, S.; Mai, H.; Leson, A.; Scholze, F.; Tümmler, J.; Ulm, G.; Legall, H.; Nickles, P.-V.; Sandner, W.; Stiel, H.; Rempel, C.; Schulze, M.; Brutscher, J.; Macco, F.; Müllender, S.
Konferenzbeitrag
2001Fabrication of InGaAsP/InP ridge waveguide lasers with dry etched facets using chemically assisted ion beam etching and a simple photoresist mask
Paraskevopoulos, A.; Hensel, H.-J.; Molzow, W.-D.; Janiak, K.; Suryaputra, E.; Roehle, H.; Wolfram, P.; Ebert, W.
Konferenzbeitrag
2000Flexible, reliable and simple fabrication of integrated spot size converters with shifting mask technique
Steingrüber, R.; Trommer, D.; Kaiser, R.; Pfeiffer, K.; Tiedke, I.
Konferenzbeitrag, Zeitschriftenaufsatz
1998Mask aligners in advanced packaging
Töpper, M.; Tönnies, D.; Wolf, J.; Engelmann, G.; Reichl, H.
Zeitschriftenaufsatz
1998Surface-micromachined electrostatic microrelay
Schiele, I.; Huber, J.; Hillerich, B.; Kozlowski, F.
Konferenzbeitrag
1997Multilevel diffractive optical elements fabricated with a single amplitude-phase mask
Pawlowski, E.; Engel, H.
Zeitschriftenaufsatz
1997Selective MOMBE growth behaviour at the lateral interface of waveguide/laser butt-joints
Kunzel, H.; Ebert, S.; Gibis, R.; Kaiser, R.; Kizuki, H.; Malchow, S.
Konferenzbeitrag
1996Fabrication of waveguide tapers by semitransparent mask photolithography
Wengelink, J.; Engel, H.
Konferenzbeitrag, Zeitschriftenaufsatz
1996One-level gray-tone design. Mask data preparation and pattern transfer
Reimer, K.; Henke, W.; Quenzer, H.J.; Pilz, W.; Wagner, B.
Konferenzbeitrag
1995Semitransparent mask technique for relief type surface topographies
Wengelink, J.; Engel, H.; Döldissen, W.
Konferenzbeitrag, Zeitschriftenaufsatz
1994Diffractive microlenses with antireflection coatings fabricated by thin film deposition
Pawlowski, E.; Engel, H.; Ferstl, M.; Furst, W.; Kuhlow, B.
Zeitschriftenaufsatz
1993Blazed Fresnel zone lenses approximated by discrete step profiles: Effects of fabrication errors
Ferstl, M.; Kuhlow, B.; Pawlowski, E.
Konferenzbeitrag
1993Computer generated microlenses with high efficiency
Pawlowski, E.; Ferstl, M.; Kuhlow, B.
Konferenzbeitrag
1993Nanostructure patterning with SOR X-ray lithography
Chlebek, J.; Huber, H.-L.; Oertel, H.K.; Reimer, K.
Konferenzbeitrag
1993Two-dimensional arrays of diffractive microlenses for optical interconnects
Kuhlow, B.; Pawlowski, E.; Ferstl, M.
Konferenzbeitrag
1992Diamond membranes for X-ray masks
Löchel, B.; Schliwinski, H.-J.; Huber, H.-L.; Trube, J.; Klages, C.-P.; Lüthje, H.; Schäfer, L.
Konferenzbeitrag
1991A 0.25 mu m NMOS transistor fabricated with X-ray lithography
Breithaupt, B.; David, H.H.; Ballhorn, R.; Jacobs, E.P.; Windbracke, W.; Zwicker, G.
Konferenzbeitrag
1991The influence of post-exposure bake on linewidth control for the resist system RAY-PN-AZPN 100- in X-ray mask fabrication
Chlebek, J.; Schulz, T.; Grimm, J.; Huber, H.-L.
Konferenzbeitrag
1991Thickness inhomogeneity during silicon X-ray mask membrane fabrication: generation and prevention
Löchel, B.; Macioßek, A.; Huber, H.-L.; König, M.
Konferenzbeitrag
1990Influence of X-ray mask repair on pattern placement accuracy
Schaffer, H.; Weigmann, U.; Petzold, C.; Mescheder, U.
Konferenzbeitrag
1990Infrared-measurement of X-ray mask heating during SR-lithography
Trube, J.; Huber, H.-L.; Mourikis, S.; Koch, E.E.; Bernstoff, S.
Konferenzbeitrag
1990Procedure and results of mask fabrication via X-ray lithography
Grimm, J.; Trube, J.; Huber, H.-L.
Konferenzbeitrag
1989Laser induced photolytic tin deposition with high deposition rates for the repair of clear X-ray mask defects
Putzar, R.; Petzold, H.-C.; Schaffer, H.; Weigmann, U.
Konferenzbeitrag
1989One-layer technique for absorber structuring of E-beam written master masks for X-ray lithography
Ehrlich, C.; Goepel, U.; Demmeler, R.; Pongratz, S.; Reimer, K.; Dammel, R.; Lignau, J.; Theis, J.
Konferenzbeitrag
1989State of the art of pattern placement accuracy of silicon X-ray master masks
Pongratz, S.; Mescheder, U.; Ehrlich, C.; Huber, H.-L.; Kohlmann, K.; Windbracke, W.
Konferenzbeitrag
1989X-ray mask repair by electron beam induced metal deposition
Brünger, W.H.
Konferenzbeitrag
1988Laser-induced metal deposition for clear defect repair work on X-ray masks
Putzar, R.; Petzold, H.-C.; Weigmann, U.
Konferenzbeitrag
1987Laser-induced metal deposition on silicon membranes for X-ray lithography
Petzold, H.-C.; Putzar, R.; Weigmann, U.; Wilke, I.
Konferenzbeitrag
1986Influence of sputter effects on the resolution in X-ray mask repair
Betz, H.; Heuberger, A.; Economou, N.P.; Shaver, D.C.
Konferenzbeitrag