Fraunhofer-Gesellschaft

Publica

Hier finden Sie wissenschaftliche Publikationen aus den Fraunhofer-Instituten.
2020Pre-Deposition Interfacial Oxidation and Post-Deposition Interface Nitridation of LPCVD TEOS Used as Gate Dielectric on 4H-SiC
Lim, Minwho; Sledziewski, Tomasz; Rommel, Mathias; Erlbacher, Tobias; Kim, Hong-Ki; Kim, Seongjun; Shin, Hoon-Kyu; Bauer, Anton J.
Konferenzbeitrag
2010Electrical characterization and reliability of nitrided-gate insulators for N- and P-type 4H-SiC MIS devices
Noborio, M.; Grieb, M.; Bauer, A.J.; Peters, D.; Friedrichs, P.; Suda, J.; Kimoto, T.
Konferenzbeitrag
2005Characterization of interface state densities by photocurrent analysis. Comparison of results for different insulator layers
Rommel, M.; Groß, M.; Ettinger, A.; Bauer, A.J.; Frey, L.; Ryssel, H.
Poster