Fraunhofer-Gesellschaft

Publica

Hier finden Sie wissenschaftliche Publikationen aus den Fraunhofer-Instituten.
2017Investigation of high-k dielectric stacks by C-AFM: Advantages, limitations, and possible applications
Rommel, Mathias; Paskaleva, Albena
Aufsatz in Buch
2013Influence of La on the electrical properties of HfSiON: From diffusion to Vth shifts
Hackenberg, M.; Pichler, P.; Baudot, S.; Essa, Z.; Gro-Jean, M.; Tavernier, C.; Schamm-Chardon, S.
Zeitschriftenaufsatz
2012Embedded ceramic capacitators in LTCC
Bartsch, H.; Barth, S.; Müller, J.
Konferenzbeitrag
2012TiO2-based metal-insulator-metal structures for future DRAM storage capacitors
Fröhlich, K.; Hudec, B.; Tapajna, M.; Hueková, K.; Rosova, A.; Eliá, P.; Aarik, J.; Rammula, R.; Kasikov, A.; Arroval, T.; Aarik, L.; Murakami, Katsuhisa; Rommel, Mathias; Bauer, Anton J.
Konferenzbeitrag
2010Electrical scanning probe microscopy techniques for the detailed characterization of high-k dielectric layers
Rommel, M.; Yanev, V.; Paskaleva, A.; Erlbacher, T.; Lemberger, M.; Bauer, A.J.; Frey, L.
Konferenzbeitrag
2009Comparative study between conventional macroscopic IV techniques and advanced AFM based methods for electrical characterization of dielectrics at the nanoscale
Yanev, V.; Erlbacher, T.; Rommel, M.; Bauer, A.J.; Frey, L.
Zeitschriftenaufsatz
2009Correlation of microscopic and macroscopic electrical characteristics of high-k ZrSixO2-x thin films using tunneling atomic force microscopy
Weinreich, W.; Wilde, L.; Kücher, P.; Lemberger, M.; Yanev, V.; Rommel, M.; Bauer, A.J.; Erben, E.; Heitmann, J.; Schröder, U.; Oberbeck, L.
Konferenzbeitrag
2008HfSiO/SiO2- and SiO2/HfSiO/SiO2-gate stacks for non-volatile memories
Erlbacher, T.; Jank, M.P.M.; Lemberger, M.; Bauer, A.J.; Ryssel, H.
Zeitschriftenaufsatz
2007Verification of grain boundaries in annealed thin ZrO2 films by electrical AFM technique
Yanev, V.; Paskaleva, A.; Weinreich, W.; Lemberger, M.; Petersen, S.; Rommel, M.; Bauer, A.J.; Ryssel, H.
Poster