Fraunhofer-Gesellschaft

Publica

Hier finden Sie wissenschaftliche Publikationen aus den Fraunhofer-Instituten.
2013Bimodal CAFM TDDB distributions in polycrystalline HfO2 gate stacks: The role of the interfacial layer and grain boundaries
Iglesias, V.; Martin-Martinez, J.; Porti, M.; Rodriguez, R.; Nafria, M.; Aymerich, X.; Erlbacher, T.; Rommel, M.; Murakami, K.; Bauer, A.J.; Frey, L.; Bersuker, G.
Zeitschriftenaufsatz
2013High-density capacitors for SiP and SoC applications based on three-dimensional integrated metal-isolator-metal structures
Weinreich, Wenke; Rudolph, Matthias; Koch, Johannes; Paul, Jan; Seidel, Konrad; Riedel, Stefan; Sundqvist, Jonas
Konferenzbeitrag
2013Optimized electrode and interface for enhanced reliability of high-k based metal-insulator-metal capacitors
Koch, Johannes; Seidel, Konrad; Weinreich, Wenke; Riedel, Stefan; Chiang, Jung-Chin; Beyer, Volkhard
Zeitschriftenaufsatz
2012Effect of HfO2 polycrystallinity on distribution of the CAFM-induced TDDB in high-k gate stacks
Iglesias, V.; Erlbacher, T.; Rommel, M.; Murakami, K.; Bauer, A.J.; Frey, L.; Porti, M.; Martin-Martinez, J.; Rodriguez, R.; Nafria, M.; Aymerich, X.; Bersuker, G.
Poster
2012Nanoscale characterization of TiO2 films grown by atomic layer deposition
Murakami, Katsuhisa; Rommel, Mathias; Bauer, Anton J.; Frey, Lothar; Hudec, Boris; Rosova, A.; Hueková, K.; Fröhlich, Karol; Kasikov, A.; Ramula, R.; Aarik, J.; Han, J.H.; Han, S.; Lee, W.; Song, S.J.; Hwang, C.S.
Poster
2011Current voltage characteristics through grains and grain boundaries of high-k dielectric thin films measured by tunneling atomic force microscopy
Murakami, K.; Rommel, M.; Yanev, V.; Bauer, A.J.; Frey, L.
Poster
2010Electrical scanning probe microscopy techniques for the detailed characterization of high-k dielectric layers
Rommel, M.; Yanev, V.; Paskaleva, A.; Erlbacher, T.; Lemberger, M.; Bauer, A.J.; Frey, L.
Konferenzbeitrag
2009Suppression of parasitic electron injection in SONOS-type memory cells using high-k capping layers
Erlbacher, T.; Graf, T.; DasGupta, N.; Bauer, A.J.; Ryssel, H.
Konferenzbeitrag, Zeitschriftenaufsatz
2008High-k: Latest developments and perspectives
Bauer, A.J.; Lemberger, M.; Erlbacher, T.; Weinreich, W.
Aufsatz in Buch
2008Physical and electrical characterization of high-k ZrO2 metal-insulator-metal capacitor
Kim, J.-H.; Ignatova, V.; Kücher, P.; Heitmann, J.; Oberbeck, L.; Schröder, U.
Zeitschriftenaufsatz
2008Schichten hoher Dielektrizitätskonstante für den Einsatz in ladungsbasierten nichtflüchtigen Speicherzellen
Erlbacher, T.
Dissertation
2007Hafnium silicate as control oxide in non-volatile memories
Erlbacher, T.; Bauer, A.J.; Ryssel, H.
Konferenzbeitrag, Zeitschriftenaufsatz