Fraunhofer-Gesellschaft

Publica

Hier finden Sie wissenschaftliche Publikationen aus den Fraunhofer-Instituten.
2019High-rate deposition of high-pure silicon thin films for PV-Absorber layers by crucible-free electron beam physical vapor deposition
Saager, Stefan; Scheffel, Bert; Heinß, Jens-Peter
Zeitschriftenaufsatz
2016High-productive aluminum deposition of back contacts for hetero-junction solar cells by electron beam evaporation
Heinß, Jens-Peter; Schlemm, Hermann; Wünsch, Frank
Konferenzbeitrag
2015High purity deposition of silicon layers with rates ≥ to 300 nm/s
Heinß, Jens-Peter; Pfefferling, Bert; Saager, Stefan; Temmler, Dietmar
Konferenzbeitrag
2015N-type and P-type silicon foils fabricated in a quasi-inline EPI reactor with bulk lifetimes exceeding 500 µs
Janz, S.; Milenkovic, N.; Drießen, M.; Reber, S.
Konferenzbeitrag
2014High-rate deposition of SI absorber layers by electron beam evaporation and first electron beam crystallization tests
Saager, Stefan; Ben Yaala, Marwa; Heinß, Jens-Peter; Temmler, Dietmar; Pfefferling, Bert; Metzner, Christoph
Konferenzbeitrag
2013High rate low pressure plasma-enhanced chemical vapor deposition for barrier and optical coatings
Günther, S.; Fahland, M.; Fahlteich, J.; Meyer, B.; Straach, S.; Schiller, N.
Konferenzbeitrag, Zeitschriftenaufsatz
2012Innovations in laser cladding and direct metal deposition
Brückner, F.; Nowotny, S.; Leyens, C.
Konferenzbeitrag
2011In-Line High-Rate Deposition of Aluminum Onto RISE Solar Cells by Electron Beam Technology
Heinß, J.P.; Mader, C.; Merkle, A.; Brendemühl, T.; Brendel, R.; Ehlers, L.; Meyer, R.
Konferenzbeitrag
2004Ultra high-rate deposition of photocatalytic TiO2 films by reactive magnetron sputtering with unipolar pulsing and plasma emission control systems
Takasawa, N.; Ohno, S.; Sato, D.; Song, P.K.; Yoshikawa, M.; Suzuki, K.; Frach, P.; Shigesato, Y.
Konferenzbeitrag