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Hier finden Sie wissenschaftliche Publikationen aus den Fraunhofer-Instituten.
2021Link between plasma properties with morphological, structural and mechanical properties of thin Ti films deposited by high power impulse magnetron sputtering
Moskovkin, Pavel; Maszl, Christian; Schierholz, Roland; Breilmann, Wolfgang; Petersen, Jan; Pflug, Andreas; Müller, Jérôme; Raza, Mohsin; Konstantinidis, Stephanos; Keudell, Achim von; Lucas, Stéphane
Zeitschriftenaufsatz
2004Transparent conductive ZnO:Al thin films prepared by in-line reactive mid-frequency magnetron sputtering
Hong, R.
Dissertation
2000Vapor phase deposition of cubic boron nitride films
Bewilogua, K.; Richter, F.
Aufsatz in Buch
1992Effect of process parameters on the residual stresses and the wear behavior of aluminium nitride physical vapor deposition coatings.
Kleer, G.; Kassner, R.; Meyer, E.-M.; Schinker, M.G.; Döll, W.
Zeitschriftenaufsatz