Fraunhofer-Gesellschaft

Publica

Hier finden Sie wissenschaftliche Publikationen aus den Fraunhofer-Instituten.
2018Analysis of Grain-Size Distribution and Yield Strength of Interconnector Ribbons and Wires at Different Streching Conditions Using Color Etching
Walter, J.; Stegmaier, J.; Kraft, A.; Eitner, U.
Konferenzbeitrag
2018The effect of etching and deposition processes on the width of spacers created during self-aligned double patterning
Baer, Eberhard; Lorenz, Juergen
Konferenzbeitrag
2018Optimization of inline processes for the production of freestanding epitaxially grown thin films for solar cells
Ivanov, Alexey; Sorgenfrei, R.; Gust, Elke; Barth, Philipp; Nieuwenhuysen, Kris van; Kühnhold-Pospischil, Saskia; Riepe, Stephan; Janz, Stefan
Konferenzbeitrag
2018Structuring of metal layers by electrochemical screen printing for back-contact solar cells
Kamp, M.; Efinger, R.; Gensowski, K.; Bechmann, S.; Bartsch, J.; Glatthaar, M.
Zeitschriftenaufsatz
2017Paste development for electrochemical screen printing to structure metal layers of back contact solar cells
Gensowski, K.; Kamp, M.; Efinger, R.; Klawitter, M.; Pospischil, M.; Eckert, J.; Bartsch, J.
Konferenzbeitrag
2017Tool optimization for dry forming applications - optimized surface preparation of ta-C
Roch, Teja; Stepien, Lukas; Kunze, Tim; Mousavi, Ali; Topalski, Slavcho; Lasagni, Andrés-Fabián; Brosius, Alexander
Zeitschriftenaufsatz
2016Alternative Inline Analysis of Acidic Etching Baths
Mohr, L.; Dannenberg, T.; Zimmer, M.; Rentsch, J.
Konferenzbeitrag
2015Nanostructuring of c-Si surface by F2-based atmospheric pressure dry texturing process
Kafle, B.; Seiffe, J.; Clochard, L.; Duffy, E.; Rentsch, J.; Hofmann, M.
Zeitschriftenaufsatz
2015Nanotextured multicrystalline Al-BSF solar cells reaching 18% conversion efficiency using industrially viable solar cell processes
Bishal, K.; Mannan, A.; Freund, T.; Clochard, L.; Duffy, E.; Hofmann, M.; Rentsch, J.; Preu, R.
Zeitschriftenaufsatz
2015Oberflächenmodifizierung mit Licht
Schmüser, Christian
Bericht
2015Relation between light trapping and surface topography of plasma textured crystalline silicon wafers
Souren, F.M.M.; Rentsch, J.; Sanden, M.C.M. van de
Zeitschriftenaufsatz
2014Challenges and opportunities for process modeling in the nanotechnology era
Lorenz, J.K.; Baer, E.; Burenkov, A.; Erdmann, A.; Evanschitzky, P.; Pichler, P.
Zeitschriftenaufsatz
2014Multicrystalline silicon solar cell improvement by atmospheric pressure dry etching process
Kafle, B.; Trogus, D.; Seiffe, J.; Clochard, L.; Duffy, E.; Hofmann, M.; Rentsch, J.
Konferenzbeitrag
2014Simultaneous simulation of systematic and stochastic process variations
Lorenz, Jürgen; Bär, Eberhard; Burenkov, Alex; Evanschitzky, Peter; Asenov, Asen; Wang, Liping; Wang, Xingsheng; Brown, Andrew; Millar, Campbell; Reid, David
Konferenzbeitrag
2013Experimental verification of the model by Klapper for 4H-SiC homoepitaxy on vicinal substrates
Kallinger, Birgit; Polster, Sebastian; Berwian, Patrick; Friedrich, Jochen; Danilewsky, A.N.
Zeitschriftenaufsatz
2013Industrial screen-printed solar cells with novel atmospheric pressure dry texturing process
Kafle, B.; Trogus, D.; Dresler, B.; Mäder, G.; Clochard, L.; Duffy, E.; Hofmann, M.; Rentsch, J.
Konferenzbeitrag
2013Laser assisted honeycomb-texturing on multicrystalline silicon for industrial applications
Volk, A.-K.; Gutscher, S.; Brand, A.; Wolke, W.; Zimmer, M.; Reinecke, H.
Konferenzbeitrag
2012Effect of metal-wrap-through holes and etching parameters on the strength of multicrystalline silicon wafers
Oswald, M.; Loewenstein, T.; Schubert, G.; Schoenfelder, S.
Konferenzbeitrag
2011Threading dislocations in n- and p-type 4H-SiC material analyzed by etching and synchrotron x-ray topography
Kallinger, B.; Polster, S.; Berwian, P.; Friedrich, J.; Müller, G.; Danilewsky, A.N.; Wehrhahn, A.; Weber, A.-D.
Zeitschriftenaufsatz
2010DLC/Si multilayer mirrors for EUV radiation
Gawlitza, P.; Braun, S.; Leson, A.; Soer, W.; Jak, M.; Banine, V.
Konferenzbeitrag
2009Crystallographic anisotropy of growth and etch rates of CVD diamond
Wolfer, M.; Biener, J.; El-Dasher, B.S.; Biener, M.M.; Hamza, A.V.; Kriele, A.; Wild, C.
Zeitschriftenaufsatz, Konferenzbeitrag
2008Micromachined mid-infrared emitter for fast transient temperature operation for optical gas sensing systems
Hildenbrand, J.; Kürzinger, A.; Peter, C.; Moretton, E.; Wöllenstein, J.; Naumann, F.; Ebert, M.; Korvink, J.
Konferenzbeitrag
2007Lithium niobate ridge waveguides fabricated by wet etching
Hu, H.; Ricken, R.; Sohler, W.; Wehrspohn, R.B.
Zeitschriftenaufsatz
2007Orthodox etching of HVPE-grown GaN
Weyher, J.L.; Lazar, S.; Macht, L.; Liliental-Weber, Z.; Molnar, R.J.; Müller, S.; Sivel, V.G.M.; Nowak, G.; Grzegory, I.
Konferenzbeitrag, Zeitschriftenaufsatz
2005Studies of fine pitch patterning by reel-to-reel processes for flexible electronic systems
Drost, A.; Klink, G.; Feil, M.; Bock, K.
Konferenzbeitrag
2003State-of-the-art mid-frequency sputtered ZnO films for thin film silicon solar cells and modules
Müller, J.; Schöpe, G.; Kluth, O.; Rech, B.; Sittinger, V.; Szyszka, B.; Geyer, R.; Lechner, P.; Schade, H.; Ruske, M.; Dittmar, G.; Bochem, H.-P.
Zeitschriftenaufsatz
2003Three-dimensional triangle-based simulation of etching processes and applications
Lenhart, O.; Bär, E.
Zeitschriftenaufsatz
2002MOVPE-based in-situ etching of InP epitaxial heterostructures
Wolfram, P.; Franke, D.; Ebert, W.; Grote, N.
Konferenzbeitrag
2002Three-dimensional triangle-based simulation of etching processes
Lenhart, O.; Bär, E.
Konferenzbeitrag
2000Conservation of low dark current of InGaAs photodiodes after NH3/HF etch with a BCB passivation layer
Schmidt, D.; Trommer, D.
Konferenzbeitrag
2000MOVPE-based in situ etching of In(GaAs)P/InP using tertiarybutylchloride
Wolfram, P.; Ebert, W.; Kreissl, J.; Grote, N.
Konferenzbeitrag, Zeitschriftenaufsatz
1999A novel flexible, reliable and easy to use technique for the fabrication of optical spot size converters for InP based PICs
Trommer, D.; Steingrüber, R.; Löffler, R.; Umbach, A.
Konferenzbeitrag
1998Experimental verification of three-dimensional simulations of LTO layer deposition on structures prepared by anisotropic wet etching of silicon
Bär, E.; Lorenz, J.; Ryssel, H.
Konferenzbeitrag
1998MOMBE grown GaInAsP (lambda g=1.05/1.15 mu m) waveguide for laser integrated photonic ICs
Kuenzel, H.; Gibis, R.; Kizuki, H.; Albrecht, P.; Ebert, S.; Harde, P.; Malchow, S.; Kaiser, R.
Konferenzbeitrag, Zeitschriftenaufsatz
1997Integrated three-dimensional topography simulation of contact hole processing
Bär, E.; Benvenuti, A.; Henke, W.; Jünemann, B.; Kalus, C.; Niedermaier, P.; Lorenz, J.
Konferenzbeitrag
1997Micro-optic fabrication using one-level gray-tone lithography
Reimer, K.; Quenzer, H.J.; Jürss, M.; Wagner, B.
Konferenzbeitrag
1997Multilevel diffractive optical elements fabricated with a single amplitude-phase mask
Pawlowski, E.; Engel, H.
Zeitschriftenaufsatz
1997The selective etching of H+ ions and its effect on the oriented growth of diamond films
Jiang, X.; Xia, Y.B.; Zhang, W.J.
Zeitschriftenaufsatz
1997Selective MOMBE growth behaviour at the lateral interface of waveguide/laser butt-joints
Kunzel, H.; Ebert, S.; Gibis, R.; Kaiser, R.; Kizuki, H.; Malchow, S.
Konferenzbeitrag
1997Surface preparation for molecular beam epitaxy-regrowth on metalorganic vapour phase epitaxy grown InP and InGaAsP layers
Passenberg, W.; Schlaak, W.
Zeitschriftenaufsatz
1996MBE regrowth on planar and patterned In(GaAs)P layers for monolithic integration
Passenberg, W.; Schlaak, W.; Umbach, A.
Konferenzbeitrag
1996MOMBE growth of high quality GaInAsP (lambda g=1.05 mu m) for waveguide applications
Kuenzel, H.; Albrecht, P.; Gibis, R.; Hamacher, M.; Schelhase, S.
Konferenzbeitrag, Zeitschriftenaufsatz
1996Nondestructive morphological characterization of latent and etched ion tracks in PETP by SANS
Häußler, F.; Hempel, M.; Birkholz, W.; Baumbach, H.; Kröning, M.
Konferenzbeitrag
1995Local material removal by focused ion beam milling and etching
Lipp, S.; Frey, L.; Franz, G.; Demm, E.; Petersen, S.; Ryssel, H.
Zeitschriftenaufsatz
1995On the role of interface properties in the degradation of metalorganic vapor phase epitaxially grown Fe profiles in InP
Roehle, H.; Schroeter-Janssen, H.; Harde, P.; Franke, D.
Konferenzbeitrag
1994Hydrating cement paste and SSNTD
Häußler, F.; Hempel, M.; Eichhorn, F.; Hempel, A.; Baumbach, H.
Aufsatz in Buch
1993Blazed Fresnel zone lenses approximated by discrete step profiles: Effects of fabrication errors
Ferstl, M.; Kuhlow, B.; Pawlowski, E.
Konferenzbeitrag
1993SIMOX and wafer bonding, combination of competitors complements one another
Gassel, H.; Vogt, H.
Konferenzbeitrag
1993Two-dimensional arrays of diffractive microlenses for optical interconnects
Kuhlow, B.; Pawlowski, E.; Ferstl, M.
Konferenzbeitrag
1992SIMOX, an efficient etch-stop to fabricate silicon membranes with well defined thickness. Part 1
Dura, H.-G.; Gassel, H.; Mokwa, W.; Vogt, H.
Konferenzbeitrag
1992SIMOX, an efficient etch-stop to fabricate silicon membranes with well defined thickness. Part 2
Dura, H.-G.; Gassel, H.; Mokwa, W.; Vogt, H.
Konferenzbeitrag
1991Thickness inhomogeneity during silicon X-ray mask membrane fabrication: generation and prevention
Löchel, B.; Macioßek, A.; Huber, H.-L.; König, M.
Konferenzbeitrag
1990Hydrogen passivation of Zn acceptors in InGaAs during reactive ion etching
Moehrie, M.
Zeitschriftenaufsatz
1990Silicon micromachining for microsensors and microactuators
Benecke, W.
Konferenzbeitrag
1989Endpoint detection for CH4/H2 reactive ion etching of InGaAsP heterostructures by mass spectrometry
Schmid, H.; Fidorra, F.; Grutzmacher, D.
Konferenzbeitrag
1989Two-dimensional simulation methods (integrated optics)
Nolting, H.-P.; Weinert, C.M.
Zeitschriftenaufsatz
1987Simultaneous fabrication of very low resistance ohmic contacts to n-InP and p-InGaAs
Kaumanns, R.; Grote, N.; Bach, H.-G.; Fidorra, F.
Konferenzbeitrag