Fraunhofer-Gesellschaft

Publica

Hier finden Sie wissenschaftliche Publikationen aus den Fraunhofer-Instituten.
1996Pinch plasmas as intensive EUV sources for laboratory applications
Lebert, R.; Rothweiler, D.; Engel, A.; Bergmann, K.; Neff, W.
Zeitschriftenaufsatz
1995Conductivity and reproducibility of e-beam induced deposited tungsten lines
Kohlmann van Platen, K.T.; Schmidt, L.; Brünger, W.H.
Konferenzbeitrag
1994Impact of chuck flatness on wafer distortion and stepper overlay - comparison of experimental and FEM results
Stauch, H.; Simon, K.; Scheunemann, H.U.; Huber, H.-L.
Zeitschriftenaufsatz
1993Diamond membranes with controlled stress for submicron lithography
Bluhm, A.; Löchel, B.; Buchmann, L.-M.; Huber, H.-L.; Klages, C.-P.; Schäfer, L.
Zeitschriftenaufsatz, Konferenzbeitrag
1993Impact of chuck flatness on wafer distortion and stepper overlay
Simon, K.; Huber, H.-L.; Gabeli, F.; Scheunemann, H.U.
Konferenzbeitrag
1993Nanostructure patterning with SOR X-ray lithography
Chlebek, J.; Huber, H.-L.; Oertel, H.K.; Reimer, K.
Konferenzbeitrag
1993Process latitude for sub-200 nanometer synchroton orbital radiation X-ray lithography
Oertel, H.K.; Chlebek, J.; Weiß, M.
Zeitschriftenaufsatz, Konferenzbeitrag
1992Complete X-ray lithography processing of an 8-level 0.4 micron CMOS test device
Staudt-Fischbach, P.; Windbracke, W.; Bernt, H.; Zwicker, G.; Friedrich, D.; Hemicker, P.; Lange, P.; Schliwinski, H.-J.; Huber, H.-L.; Scheunemann, U.; Simon, K.
Konferenzbeitrag
1992Diamond membrane based X-ray masks
Löchel, B.; Huber, H.-L.; Klages, C.-P.; Schäfer, L.; Bluhm, A.
Konferenzbeitrag
1992Diamond membranes for X-ray masks
Löchel, B.; Schliwinski, H.-J.; Huber, H.-L.; Trube, J.; Klages, C.-P.; Lüthje, H.; Schäfer, L.
Konferenzbeitrag
1992Overlay performance of an advanced X-ray stepper (XRS 200)
Gabeli, F.; Kucinski, A.; Simon, K.; Scheunemann, H.U.
Konferenzbeitrag
1991A 0.25 mu m NMOS transistor fabricated with X-ray lithography
Breithaupt, B.; David, H.H.; Ballhorn, R.; Jacobs, E.P.; Windbracke, W.; Zwicker, G.
Konferenzbeitrag
1991Growth and properties of diamond films prepared by MPCVD using different oxygen-containing source gases
Schäfer, L.; Klages, C.-P.
Zeitschriftenaufsatz, Konferenzbeitrag
1991The influence of post-exposure bake on linewidth control for the resist system RAY-PN-AZPN 100- in X-ray mask fabrication
Chlebek, J.; Schulz, T.; Grimm, J.; Huber, H.-L.
Konferenzbeitrag
1991Modelling of illumination effects on resist profiles in X-ray lithography
Oertel, H.; Weiß, M.; Huber, H.-L.; Vladimirsky, Y.; Maldonado, J.R.
Konferenzbeitrag
1991Thickness inhomogeneity during silicon X-ray mask membrane fabrication: generation and prevention
Löchel, B.; Macioßek, A.; Huber, H.-L.; König, M.
Konferenzbeitrag
1990Comparison between surface channel PMOS transistors processed with optical and X-ray lithography with regard to X-ray damage
Naumann, F.; Bernt, H.; Friedrich, D.; Kaatz, A.; Windbracke, W.
Konferenzbeitrag
1990Influence of X-ray mask repair on pattern placement accuracy
Schaffer, H.; Weigmann, U.; Petzold, C.; Mescheder, U.
Konferenzbeitrag
1990Infrared-measurement of X-ray mask heating during SR-lithography
Trube, J.; Huber, H.-L.; Mourikis, S.; Koch, E.E.; Bernstoff, S.
Konferenzbeitrag
1990Percolation theory and resist development in X-ray lithography
Oertel, H.; Weiß, M.; Dammel, R.; Theis, J.
Konferenzbeitrag
1990Procedure and results of mask fabrication via X-ray lithography
Grimm, J.; Trube, J.; Huber, H.-L.
Konferenzbeitrag
1990Silicon membrane mask blanks for X-ray and ion projection lithography
Löchel, B.; Chlebek, J.; Huber, H.-L.; Macioßek, A.; Grimm, J.
Zeitschriftenaufsatz, Konferenzbeitrag
1989High sensitivity positive tone X-ray resist: RAY-PF performance under e-beam exposure
Menschig, A.; Forchel, A.; Dammel, R.; Lingnau, J.; Pongratz, S.; Scheunemann, U.; Theis, J.
Konferenzbeitrag
1989Laser induced photolytic tin deposition with high deposition rates for the repair of clear X-ray mask defects
Putzar, R.; Petzold, H.-C.; Schaffer, H.; Weigmann, U.
Konferenzbeitrag
1989Microstructuring in semiconductor technology
Mader, H.
Konferenzbeitrag
1989Multi-beam concepts for nanometer devices
Lischke, B.; Brunner, M.; Herrmann, K.H.; Heuberger, A.; Knapek, E.; Schnakenberg, U.; Bennecke, W.; Schäfer, P.
Zeitschriftenaufsatz
1989One-layer technique for absorber structuring of E-beam written master masks for X-ray lithography
Ehrlich, C.; Goepel, U.; Demmeler, R.; Pongratz, S.; Reimer, K.; Dammel, R.; Lignau, J.; Theis, J.
Konferenzbeitrag
1989Repair of clear defects on X-ray masks by ion-induced metal deposition
Petzold, H.-C.; Burghause, H.; Putzar, R.; Weigmann, U.; Economou, N.P.; Stern, L.A.
Konferenzbeitrag
1989Repetitive plasma focus as radiation source for X-ray lithography.
Richter, F.; Eberle, J.; Holz, R.; Neff, W.; Lebert, R.
Konferenzbeitrag
1989State of the art of pattern placement accuracy of silicon X-ray master masks
Pongratz, S.; Mescheder, U.; Ehrlich, C.; Huber, H.-L.; Kohlmann, K.; Windbracke, W.
Konferenzbeitrag
1989X-ray mask repair by electron beam induced metal deposition
Brünger, W.H.
Konferenzbeitrag
1988Laser-induced metal deposition for clear defect repair work on X-ray masks
Putzar, R.; Petzold, H.-C.; Weigmann, U.
Konferenzbeitrag
1988Reparatur von Röntgenmasken
Weigmann, U.
Konferenzbeitrag
1988Small spot ESCA and scanning XPS investigations compared to scanning auger microanalysis.
Brünger, W.H.
Zeitschriftenaufsatz
1988Soft x-ray radiation from laser-produced plasmas - characterization of radiation emission and its use in x-ray lithography
Kühne, M.; Petzold, H.-C.
Zeitschriftenaufsatz
1988X-ray lithography
Heuberger, A.
Zeitschriftenaufsatz
1987Application of lead electroplating for X-ray absorber patterning
Trube, J.; Huber, H.-L.; Löchel, B.; Windbracke, W.
Zeitschriftenaufsatz
1987Half micrometer N-MOS technology using X-ray lithography
Huber, H.-L.; Lauer, V.; Bauer, F.; Korec, J.; Balk, P.
Konferenzbeitrag
1987High resolution e-beam lithography for X-ray mask making
Demmeler, R.; Ehrlich, C.; Pongratz, S.; Reimer, K.
Zeitschriftenaufsatz
1987Identification and removal of opaque defects on X-ray masks in a focussed ion beam repair system
Weigmann, U.; Burghause, H.; Schaffer, H.
Zeitschriftenaufsatz
1987Influence of phase shift on pattern transfer in X-rax lithography
Oertel, H.; Huber, H.-L.; Weiß, M.
Zeitschriftenaufsatz
1987The influence of photoelectronics and fluorescence radiation on resolution in X-rax lithography
Chlebek, J.; Heuberger, A.; Huber, H.-L.; Betz, H.
Zeitschriftenaufsatz
1987Laser-induced metal deposition on silicon membranes for X-ray lithography
Petzold, H.-C.; Putzar, R.; Weigmann, U.; Wilke, I.
Konferenzbeitrag
1987Linewidth metrology for X-rax masks with subhalfmicron feature size
Huber, H.-L.; Mescheder, U.; Mund, F.
Zeitschriftenaufsatz
1987Maskenherstellung mit Hilfe der Mikromechanik
Csepregi, L.
Konferenzbeitrag
1987Photocatalytic novolak - based positive resist for X-ray lithography - kinetics and simulation
Huber, H.-L.; Oertel, H.; Dössel, K.F.; Dammel, R.; Lingnau, J.; Theis, J.
Zeitschriftenaufsatz
1987Repair of clear X-ray mask defects by laser-induced metal deposition
Petzold, H.-C.; Putzar, R.; Weigmann, U.; Wilke, I.
Zeitschriftenaufsatz
1987Reparatur von Röntgenmasken mit Ionenstrahlen
Weigmann, U.
Konferenzbeitrag
1987Temperaturänderungen von Silizium-Membranen durch Absorption von Röntgenstrahlung
Trube, J.; Huber, H.-L.
Abstract
1986Influence of sputter effects on the resolution in X-ray mask repair
Betz, H.; Heuberger, A.; Economou, N.P.; Shaver, D.C.
Konferenzbeitrag