Hier finden Sie wissenschaftliche Publikationen aus den Fraunhofer-Instituten.
2020Design and fabrication of 4h-Sic Mosfets with optimized JFET and p-body design
Ni, W.; Wang, X.; Feng, C.; Xiao, H.; Jiang, L.; Li, W.; Wang, Q.; Li, M.; Schlichting, H.; Erlbacher, T.
2020The effects of carbon incorporation on the refractive index of PECVD silicon oxide layers
Torda, Benjamin; Rachdi, Lazhar; Mohamed Okasha Mohamed Okasha, Asmaa; Saint-Cast, Pierre; Hofmann, Marc
2018Influence of rf substrate bias on density and mechanical properties of sputtered SiO2 thin films for SAW applications
Täschner, Kerstin; Hildisch, Jahn; Bartzsch, Hagen; Modes, Thomas; Zywitzki, Olaf
2018Optical grade SiO₂ films prepared by HWCVD
Sittinger, V.; Höfer, M.; Harig, T.; Justianto, M.; Thiem, H.; Vergöhl, M.; Schäfer, L.
2010Characterization of thickness variations of thin dielectric layers at a nanoscale using Scanning Capacitance Microscopy
Yanev, V.; Rommel, M.; Bauer, A.J.; Frey, L.
2009Investigations on the effect of dielectric barrier discharge (DBD) treatment as a preconditioning method for low temperature silicon wafer bonding
Michel, B.; Eichler, M.; Klages, C.-P.
2006Pulse magnetron sputtering in a reactive gas mixture of variable composition to manufacture multilayer and gradient optical coatings
Lange, S.; Bartzsch, H.; Frach, P.; Goedicke, K.
2005Functional coatings deposition in microfluidic systems by dbd-based PA-CVD
Eichler, M.; Thomas, M.; Hacker, J.; Klages, C.-P.
2004Reactive pulsed magnetron sputtering of SiO2 - influence of process parameters on layer properties
Nyderle, R.; Kirchhoff, V.; Vanecek, R.; Sahm, H.
2003Simulation of reactive sputtering kinetics in real in-line processing chambers
Pflug, A.; Szyszka, B.; Niemann, J.
1999Ex situ and in situ spectroscopic ellipsometry of MF and DC-sputtered TiO2 and SiO2 films for process control
Vergöhl, M.; Malkomes, N.; Staedler, T.; Matthee, T.; Richter, U.
1997Adhesion Mechanism of Aluminum, Aluminum Oxide, and Silicon Oxide on Biaxially Oriented Polypropylene (BOPP), Poly(ethyleneterephthalate) (PET), and Poly(vinyl Chloride) (PVC)
Bichler, C.; Langowski, H.-C.; Moosheimer, U.; Seifert, B.
1995Elektronenspektroskopische Charakterisierung der Adhäsion von Triazinderivaten und Cyansäureestern auf Siliziumoberflächen
Dieckhoff, S.
1995Room-temperature, high-deposition-rate, plasma-enhanced chemical vapour deposition of silicon oxynitride thin films producing low surface damage on lattice-matched and pseudomorphic III-V quantum-well structures
Sah, R.E.; Ralston, J.D.; Eichin, G.; Dischler, B.; Rothemund, W.; Wagner, J.; Larkins, E.C.; Baumann, H.
1994Improvement of SIMOX buried oxide breakdown voltage by multiple step and multiple energy implantation
Gassel, H.; Vogt, H.
1994Structure and electrical characteristics of a thin buried oxide containing silicon inclusions
Meda, L.; Bertoni, S.; Cerofolini, G.; Spaggiari, C.; Gassel, H.