Fraunhofer-Gesellschaft

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Hier finden Sie wissenschaftliche Publikationen aus den Fraunhofer-Instituten.
1999Reliability of ultra-thin gate oxides grown in low-pressure N20 ambient or on nitrogen-implanted silicon
Bauer, A.J.; Beichele; Herden, M.; Ryssel, H.
Konferenzbeitrag
1995Damage characterization of ion beam exposed metal-oxide-semiconductor varactor cells by charge to breakdown measurements
Brünger, W.H.; Buchmann, L.-M.; Naumann, F.; Friedrich, D.; Finkelstein, W.; Mohondro, R.
Konferenzbeitrag