Hier finden Sie wissenschaftliche Publikationen aus den Fraunhofer-Instituten.
2016Al in ZnO - from doping to alloying. An investigation of Al electrical activation in relation to structure and charge transport limits
Cornelius, Steffen; Vinnichenko, Mykola
Journal Article
2013Precise microstructuring of indium-tin oxide thin films on glass by selective femtosecond laser ablation
Krause, S.; Miclea, P.T.; Steudel, F.; Schweizer, S.; Seifert, G.
Journal Article
2013Pulsed DC magnetron sputtering of transparent conductive oxide layers
Bingel, Astrid; Füchsel, Kevin; Kaiser, Norbert; Tünnermann, Andreas
Journal Article
2011Evaluation of textured TCOs for a-SI:H/µc-SI:H thin film solar cells by angular resolved light scattering measurements
Dewald, W.; Sittinger, V.; Szyszka, B.; Wippler, D.; Hüpkes, J.; Obermeyer, P.; Hamelmann, F.; Stiebig, H.; Säuberlich, F.; Severin, D.; Klein, S.; Rohde, M.; Schmidt, U.
Conference Paper
2011In-line processing of hot wire CVD a-SI:H solar cells using different ZnO:Al morphologies as front contact
Sittinger, V.; Laukart, A.; Harig, T.; Höfer, M.; Dewald, W.; Britze, C.; Schäfer, L.; Szyszka, B.; Bräuer, G.
Conference Paper
2011Transparent conductive oxides for nano-SIS solar cells
Füchsel, K.; Bingel, A.; Kaiser, N.; Tünnermann, A.
Conference Paper
2010Angular resolved light scattering of structured TCOs for the application in a-Si:H/µc-Si:H solar cells
Dewald, W.; Sittinger, V.; Szyszka, B.; Gordijn, A.; Hüpkes, J.; Hamelmann, F.; Stiebig, H.; Säuberlich, F.
Conference Paper
2010Development of new transparent conductors and device applications utilizing a multidisciplinary approach
Szyszka, B.; Löbmann, P.; Georg, A.; May, C.; Elsässer, C.
Journal Article
2010ITO thin films prepared by synchronal pulsed RF-DC sputtering
Heimke, B.; Nyderle, R.; Junghähnel, M.; Hartung, U.; Kopte, T.; Junghähnel, M.
Conference Paper
2010Nanostructured SIS solar cells
Füchsel, K.; Schulz, U.; Kaiser, N.; Käsebier, T.; Kley, E.-B.; Tünnermann, A.
Conference Paper
2010Preparation and characterization of Cu'Me"'
Polenzky, C.; Ortner, K.; Szyszka, B.
Conference Paper
2010Properties of transparent conductive niobium doped titania (TNO) thin film deposited by large area DC and pulsed DC sputtering
Junghähnel, M.; Heimke, B.; Hartung, U.; Kopte, T.; Zywitzki, O.
Conference Paper
2010Synchronal pulsed RF superimposed DC sputtering of aluminium doped zinc oxide (ZnO:Al)
Heimke, B.; Hartung, U.; Kopte, T.; Junghähnel, M.; Nyderle, R.
Conference Paper
2009Optical modeling of free electron behavior in highly doped ZnO films
Ruske, F.; Pflug, A.; Sittinger, V.; Szyszka, B.; Greiner, D.; Rech, B.
Journal Article
2006High rate deposition of tin-doped indium oxide films by reactive magnetron sputtering with unipolar pulsing and plasma emission feedback systems
Ohno, S.; Kawaguchi, Y.; Miyamura, A.; Sato, Y.; Song, P.K.; Yoshikawa, M.; Frach, P.; Shigesato, Y.
Journal Article
2004Transparent conductive ZnO:Al thin films prepared by in-line reactive mid-frequency magnetron sputtering
Hong, R.
2003Studies on ZnO:Al thin films deposited by in-line reactive mid-frequency magnetron sputtering
Hong, R.J.; Jiang, X.; Szyszka, B.; Sittinger, V.; Pflug, A.
Journal Article